A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.

A portable water conditioning system is provided that includes an incoming water inlet; a reverse osmosis stage in fluid communication with the incoming water inlet, the reverse osmosis stage having a permeate outlet and a concentrate outlet; a diversion device having a diversion valve, the diversion valve placing the concentrate outlet in fluid communication with a waste water outlet; a deionizing stage in fluid communication with a pure water outlet; a bypass valve configured to selectively place the permeate outlet in fluid communication with one or more of the waste water outlet, the deionizing stage, and the pure water outlet; and a controller configured to control the diversion device and the bypass valve to provide water at the pure water outlet of a desired condition.

A method for separating water from a mixture containing water and at least one volatile acidic substance and/or at least one volatile basic substance may include converting the at least one volatile acidic substance into the corresponding non-volatile basic substance by an acid-base reaction and/or converting the at least one basic substance into the corresponding non-volatile acidic substance, and separating the water from the at least one non-volatile acidic substance and/or the at least one non-volatile basic substance.

The present disclosure relates generally to oxidation of ammonia using electrochemistry. Methods and systems may include at least one sensor to measure the concentration of ammonia in the effluent and/or the concentration of chlorine gas in the effluent. Methods and systems may also include at least one controller in communication with the sensor and/or the anode to reduce the current density of the anode generating the chlorine, and/or to change the flow rate of the ammonia containing water entering the reactor.

A method including directing an aqueous solution having dissolved carbon dioxide and dissolved ozone into a vessel, removing an amount of the dissolved carbon dioxide and irradiating the effluent with ultraviolet light to decompose an amount of the dissolved ozone is disclosed. The method may include removing the dissolved carbon dioxide by controlling pH. The method may include removing the dissolved carbon dioxide by contact with a membrane degasifier. A system including a channel fluidly connectable to a source of an aqueous solution having dissolved carbon dioxide and dissolved ozone, a dissolved carbon dioxide removal subsystem, and a source of ultraviolet irradiation is also disclosed. The dissolved carbon dioxide removal subsystem may include a source of a pH adjuster. The dissolved carbon dioxide removal subsystem may include a membrane degasifier.

A method of inhibiting scale in an industrial water system includes the steps of dosing the industrial water system with a water treatment polymer comprising at least 10 mol % of carboxylic acid monomer and a quaternized naphthalimide fluorescent monomer as disclosed herein, and then monitoring the fluorescence of the water system. The polymers are also useful for flocculation and coagulation in wastewater treatment.

A water quality management method for managing the concentration of impurity ions contained in the water to be analyzed includes connecting the ion adsorption device in which the ion adsorbent and the accumulated flow rate meter are provided to the blanch pipe, passing the water being analyzed from the blanch pipe to the ion adsorbent for a predetermined period of time to the ion adsorption device and adsorbing ions contained in the water being analyzed an ion adsorbent sample. In the ion adsorption device, an accumulated flow rate meter is provided on the downstream side of the flow direction of the water being analyzed of the ion adsorbent.

A method and system for operating a seal gas compressor utilized in a direct reduction process including: monitoring a pH level of a water stream used in the seal gas compressor, wherein the pH level of the water stream is affected by a reformer flue gas stream that comes into contact with the water stream, wherein the monitoring step is carried out one or more of upstream of the seal gas compressor and downstream of the compressor; and adjusting the pH level of the water stream to maintain the pH level of the water stream within a predetermined range based on feedback from the monitoring step. The method includes maintaining the pH level of the water stream upstream of the seal gas compressor in a range between 7.5 and 10 and maintaining the pH level of the water stream downstream of the seal gas compressor in a range between 7.8 and 9.5.

The present invention relates to reduction of per- and polyfluoroalkyl compounds (PFAS) in a desired zone of treatment for the continuous remediation of contaminated solids and liquids. In particular, embodiments of the present invention relate to the in-situ treatment of solids and liquids by a particular combination of reagent and conditions. The reagents include an oxidant and a metal catalyst. Disclosed method combines low temperature thermal remediation with chemical oxidation to destroy poly- and perfluoroalkyl substances in-situ. The disclosed methods may enhance destruction of organic contaminants in the desired zone of treatment. The present invention also relates to a method for applying the remediation compositions to contaminated sites and controlling the process by monitoring the degradation event to achieve maximum reduction of PFAS.

In a system for decomposing organic compounds in water for use in semiconductor manufacturing, a chemical reactor vessel having a fluid inlet and a fluid outlet, a persulfate anion addition system upstream of the reactor vessel, and a light emitting device contained within the reactor vessel. The light emitting device provides light capable of decomposing persulfate anions.