C03B19/06

SYSTEM AND METHOD FOR DIRECT ELECTROLESS PLATING OF 3D-PRINTABLE GLASS FOR SELECTIVE SURFACE PATTERNING

The present disclosure relates to a method for forming a glass structure having a metallized surface portion. The method may comprise forming a structure using a flowable first material, adapted to form a glass, which includes a metal component. The structure is then treated to remove substantially all solvents and organic components contained in the first flowable material. Finally, the structure is exposed to a bath of a metal salt during which nucleation occurs and a metallized surface coating is formed on at least a portion of an outer surface of the structure.

Three-dimensional printing processes using 1,1-di-activated vinyl compounds

A process for producing an article by three-dimensional printing includes applying a 1,1-di-activated vinyl compound-containing liquid binder over a predetermined area of a layer of solid particles. The liquid binder infiltrates gaps between the solid particles to form a first cross-sectional layer of an article, and the 1,1-di-activated vinyl compound reacts to solidify the liquid binder and bind the solid particles in the first cross-sectional layer of the article. Also provided is an article produced by the three-dimensional printing process, set forth herein.

Quartz glass component of high thermal stability, semifinished product therefor, and method for producing the same

In a known method for producing a quartz glass component, a crystal formation layer containing a crystallization promoter is produced on a coating surface of a base body of quartz glass. Starting therefrom, to provide a method for producing a quartz glass component of improved thermal strength and long-term stability which displays a comparatively small deformation particularly also in the case of rapid heating-up processes, it is suggested according to one aspect that a porous crystal formation layer containing amorphous SiO.sub.2 particles is produced with a mean thickness in the range of 0.1 to 5 mm, and that a substance which contains cesium and/or rubidium is used as the crystallization promoter.

HEAT-REFLECTING MEMBER, AND METHOD FOR MANUFACTURING GLASS MEMBER HAVING HEAT-REFLECTING LAYER INCLUDED THEREIN

Provided is a heat reflective member, which is prevented from braking even in a high-temperature environment. It generates no dust in use, and can be washed with a chemical liquid. The heat reflective member has a laminated structure in which quartz glass layers are formed on an upper surface and a lower surface of a siliceous sintered powder layer. The heat reflective member includes: an impermeable layer which is formed at a portion of the siliceous sintered powder layer at an end portion of the heat reflective member, which has a thickness at least larger than half of a thickness of the siliceous sintered powder layer, and through which a gas or a liquid is prevented from penetrating; and a buffer layer which is formed between the impermeable layer and the siliceous sintered powder layer, and which changes in density from the impermeable layer toward the sintered powder layer.

METHOD FOR MANUFACTURING HIGH SILICATE GLASS SUBSTRATE, HIGH SILICATE GLASS SUBSTRATE AND POROUS GLASS

A method for producing a high silicate glass substrate, includes: (1) obtaining a glass precursor containing, as represented by mol % based on oxides, 60% to 75% of SiO.sub.2, 0% to 15% of Al.sub.2O.sub.3, 15% to 30% of B.sub.2O.sub.3, 0% to 3% of P.sub.2O.sub.5, and 1% to 10% in total of at least one selected from R.sub.2O and R′O; (2) applying first heat treatment to the glass precursor to cause phase separation so as to obtain a phase-separated glass; (3) applying acid treatment to the phase-separated glass to make the phase-separated glass porous so as to obtain a porous glass; (4) drying the porous glass so that a rate of change in mass reaches 10% to 50%; and (5) applying second heat treatment to the porous glass to sinter the porous glass so as to obtain a high silicate glass substrate.

METHOD FOR MANUFACTURING HIGH SILICATE GLASS SUBSTRATE, HIGH SILICATE GLASS SUBSTRATE AND POROUS GLASS

A method for producing a high silicate glass substrate, includes: (1) obtaining a glass precursor containing, as represented by mol % based on oxides, 60% to 75% of SiO.sub.2, 0% to 15% of Al.sub.2O.sub.3, 15% to 30% of B.sub.2O.sub.3, 0% to 3% of P.sub.2O.sub.5, and 1% to 10% in total of at least one selected from R.sub.2O and R′O; (2) applying first heat treatment to the glass precursor to cause phase separation so as to obtain a phase-separated glass; (3) applying acid treatment to the phase-separated glass to make the phase-separated glass porous so as to obtain a porous glass; (4) drying the porous glass so that a rate of change in mass reaches 10% to 50%; and (5) applying second heat treatment to the porous glass to sinter the porous glass so as to obtain a high silicate glass substrate.

QUARTZ GLASS WITH LOW CONTENT OF HYDROXYL AND HIGH PURITY AND METHOD FOR PREPARING THE SAME

A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.

PRODUCTION OF GLASS BODIES FROM POLYMERISABLE SOLUTIONS

A method for producing a solid body of glass is described. The method comprises providing a polymerisable composition, curing the polymerisable composition to obtain a cured body, subjecting the cured body to thermal debinding to substantially remove the organic components in the cured body, and subjecting the cured body to sintering to obtain a solid body of silica glass. The polymerisable composition one or more at least partially organic polymerisable compound(s) which form a liquid composition at operating temperature and a solid source of silica as colloidal silica particles or silica glass micro-/nanoparticles dispersed in the liquid composition. The one or more at least partially organic polymerisable compounds comprises at least one organosilicon compound as a second source of silica that is liquid or solubilisable in the liquid composition at operating temperature to thereby increase the silica loading of the cured body prior to sintering. Compositions and methods for producing solid glass objects by additive manufacturing are also described.

PRODUCTION OF GLASS BODIES FROM POLYMERISABLE SOLUTIONS

A method for producing a solid body of glass is described. The method comprises providing a polymerisable composition, curing the polymerisable composition to obtain a cured body, subjecting the cured body to thermal debinding to substantially remove the organic components in the cured body, and subjecting the cured body to sintering to obtain a solid body of silica glass. The polymerisable composition one or more at least partially organic polymerisable compound(s) which form a liquid composition at operating temperature and a solid source of silica as colloidal silica particles or silica glass micro-/nanoparticles dispersed in the liquid composition. The one or more at least partially organic polymerisable compounds comprises at least one organosilicon compound as a second source of silica that is liquid or solubilisable in the liquid composition at operating temperature to thereby increase the silica loading of the cured body prior to sintering. Compositions and methods for producing solid glass objects by additive manufacturing are also described.

REFLECTIVE MEMBER AND GLASS LAYERED MEMBER PRODUCTION METHOD

One aspect is a reflective member, which has a laminated structure in which transparent quartz glass members are formed on an upper surface and a lower surface of an opaque siliceous sintered powder layer. The opaque siliceous sintered powder layer has a thickness of 0.1 mm or more and a thickness distribution of ±0.05 mm or less. When a load is applied to each of the transparent quartz glass members on an upper surface and a lower surface of the laminated structure in a direction parallel to the laminated structure, the reflective member is fractured at a load of 5 N or more per square centimeter. The laminated structure includes a semi-transparent portion having a width of 0.01 mm or less, which has an intermediate opacity between an opacity of the opaque siliceous sintered powder layer and an opacity of each of the transparent quartz glass members.