C03B19/14

Method and device for producing rod lenses

A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of at least 800 mm. The method is characterized in that fabrication is performed from a cylindrical rod lens element made from synthetic quartz glass material configured as a fused silica ingot. This is performed using a flame hydrolysis method with a direct one stage deposition process of SIO.sub.x particles from a flame stream onto die that rotates and is moveable in a linear manner with respect to the flame stream.

Method and device for producing rod lenses

A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of at least 800 mm. The method is characterized in that fabrication is performed from a cylindrical rod lens element made from synthetic quartz glass material configured as a fused silica ingot. This is performed using a flame hydrolysis method with a direct one stage deposition process of SIO.sub.x particles from a flame stream onto die that rotates and is moveable in a linear manner with respect to the flame stream.

GLASS SHEET AND SYSTEM AND METHOD FOR MAKING GLASS SHEET

A method includes impregnating a region of a glass sheet with a filler material in a liquid state. The glass sheet includes a plurality of glass soot particles. The filler material is solidified subsequent to the impregnating step to form a glass/filler composite region of the glass sheet.

METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT

A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO.sub.2—SiO.sub.2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO.sub.2—SiO.sub.2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO.sub.2—SiO.sub.2-soot particles.

METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT

A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO.sub.2—SiO.sub.2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO.sub.2—SiO.sub.2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO.sub.2—SiO.sub.2-soot particles.

ALTERNATIVE FLUORINATING AGENTS FOR THE PRODUCTION OF FLUORINATED QUARTZ GLASS

A process for producing a fluorinated quartz glass is described, including providing an SiO.sub.2 soot body; reacting the SiO.sub.2 soot body with a fluorinating agent having a boiling point of greater than or equal to −10° C. to obtain a fluorinated SiO.sub.2 soot body; and vitrifying the fluorinated SiO.sub.2 soot body.

PROCESS FOR THE PREPARATION OF FLUORINATED QUARTZ GLASS

A process for the production of a fluorinated quartz glass including the steps of generating SiO.sub.2 particles in a synthesis burner; depositing the resulting SiO.sub.2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner.

PROCESS FOR THE PREPARATION OF FLUORINATED QUARTZ GLASS

A process for the production of a fluorinated quartz glass including the steps of generating SiO.sub.2 particles in a synthesis burner; depositing the resulting SiO.sub.2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner.

Joining method for optical part
11365146 · 2022-06-21 · ·

A method for joining an optical part made of quartz glass and a supporting part made of ceramic includes forming a metal layer on a surface of the supporting part by electroless plating, polishing the formed metal layer with a polishing pad to form a first smoothed face on the supporting part surface, polishing a surface of the optical part with the polishing pad to form a second smoothed face, cleaning the first smoothed face and the second smoothed face with ultrasonic cleaning water, forming a first metal film on the first smoothed face by vapor deposition and forming a second metal film on the second smoothed face by vapor deposition, and joining the first metal film and the second metal film to each other by interatomic joining by atomic diffusion between the faces at which the first metal film and the second metal film contact with each other.

PROCESS FOR THE PREPARATION OF SYNTHETIC QUARTZ GLASS

Described is a method of producing synthetic fused silica in which the synthetic flame used in the method has a ratio of the Full Width at Half Maximum (FWHM.sub.vert) vertical luminous intensity to the Full Width at Half Maximum (FWHM.sub.hori) horizontal luminous intensity greater than 10 in a targetless state, the luminous intensities being measured in candela/mm.sup.2.