A Photonic Crystal Fiber (PCF) a method of its production and a supercontinuum light source comprising such PCF. The PCF has a longitudinal axis and includes a core extending along the length of said longitudinal axis and a cladding region surrounding the core. At least the cladding region includes a plurality of microstructures in the form of inclusions extending along the longitudinal axis of the PCF in at least a microstructured length section. In at least a degradation resistant length section of the microstructured length section the PCF includes hydrogen and/or deuterium. In at least the degradation resistant length section the PCF further includes a main coating surrounding the cladding region, which main coating is hermetic for the hydrogen and/or deuterium at a temperature below T.sub.h, wherein T.sub.h is at least about 50° C., preferably 50° C.<T.sub.h<250° C.

Provided is a method of fabricating an optical fiber glass base material, the method including a first step for dehydrating an optical fiber porous base material while causing a gas that includes at least a halogen or argon to distribute within a quartz core tube that accommodates the optical fiber porous base material; a second step for, after the first step, at least partially ventilating within the quartz core tube by causing a gas having helium as a main component to distribute within the quartz core tube; and a third step for, after the second step, transparently vitrifying the optical fiber porous base material while causing the gas having helium as a main component to distribute within the quartz core tube.

A preform for optical fiber made of a quartz glass sintered body which is made from quartz glass powder as a main raw material, in which at least a portion of the quartz glass sintered body is an opaque body, the opaque body has a visible light transmittance of 90% or less at a length of 5 mm or less in one direction, and the opaque body has a bulk density of 2.1 g/cm.sup.3 or more, or the opaque body has a visible light transmittance of 90% or less at a length of 5 mm or less in one direction, and the opaque body has an open porosity of 3.5% or less.

A Photonic Crystal Fiber (PCF) a method of its production and a supercontinuum light source comprising such PCF. The PCF has a longitudinal axis and includes a core extending along the length of said longitudinal axis and a cladding region surrounding the core. At least the cladding region includes a plurality of microstructures in the form of inclusions extending along the longitudinal axis of the PCF in at least a microstructured length section. In at least a degradation resistant length section of the microstructured length section the PCF includes hydrogen and/or deuterium. In at least the degradation resistant length section the PCF further includes a main coating surrounding the cladding region, which main coating is hermetic for the hydrogen and/or deuterium at a temperature below T.sub.h, wherein Th is at least about 50° C., preferably 50° C.<Th.sub.h<250° C.

A Photonic Crystal Fiber (PCF) a method of its production and a supercontinuum light source comprising such PCF. The PCF has a longitudinal axis and includes a core extending along the length of said longitudinal axis and a cladding region surrounding the core. At least the cladding region includes a plurality of microstructures in the form of inclusions extending along the longitudinal axis of the PCF in at least a microstructured length section. In at least a degradation resistant length section of the microstructured length section the PCF includes hydrogen and/or deuterium. In at least the degradation resistant length section the PCF further includes a main coating surrounding the cladding region, which main coating is hermetic for the hydrogen and/or deuterium at a temperature below T.sub.h, wherein T.sub.h is at least about 50° C., preferably 50° C.<T.sub.h<250° C.

One aspect is a method for producing a hollow porous quartz glass base material. Even when the hollow porous quartz glass base material is produced in large weight and high bulk density, the ease of target extraction is maintained and target extraction is performed stably. The method includes preparing a heat resistant substrate, which has an outer surface on which SiO.sub.2 particles are deposited, the outer surface having a surface roughness in which the maximum height Rz is less than 9 μm and the arithmetic average roughness Ra is less than 1 μm. The heat resistant substrate is rotated and SiO.sub.2 particles are deposited on the outer surface of the heat resistant substrate to form a glass particulate deposit. The heat resistant substrate is extracted from the glass particulate deposit to produce the base material.

A large sized opaque quartz glass ingot having an excellent heat ray shielding property, an outstanding light blocking property, high mechanical strength and small roughness of a baked finished smooth surface.

The shape of bubbles inside the quartz glass are almost complete spheres and the average particle size of the bubbles is 1 μm or less, such that the strength of the opaque quartz glass ingot is increased as the stress concentration at the edges of the bubbles is eliminated and an increase of surface roughness caused by baking is alleviated.

A system and method for sintering a thin, high purity fused silica glass sheet having a thickness of 500 μm or less, includes a step of rastering a beam of a laser across a sheet of high purity fused silica soot; wherein a pattern of the rastering includes tightly spacing target locations on the sheet such that the laser sinters the soot and simultaneously forms tiny notches on a first major surface of the sheet when viewed in cross-section, wherein the tiny notches are crenellated such that at least some of the notches have generally flat bottom surfaces and at least some respective adjoining caps have generally plateau top surfaces offset from the bottom surfaces by steeply-angled sidewalls.

Provided is a manufacturing method for a porous glass deposit, comprising by depositing glass fine particle onto a starting material being pulled up in a rotating manner within a reaction chamber using a plurality of burners by which glass fine particles are deposited at positions that are different from each other, supplying humidified clean air to the reaction chamber through an air inlet provided on a wall surface of the reaction chamber in a manufacturing process of the porous glass deposit.

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO.sub.2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO.sub.2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO.sub.2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m.sup.2/g. A device for carrying out the method is also provided.