Methods for manufacturing a carbon-containing glass material are disclosed. The method includes flowing a hydrocarbon gas and silane into a reactor, and providing an additive to the reactor. The method includes generating a non-thermal equilibrium plasma based on excitement of the hydrocarbon gas and the silane by a microwave energy, where the non-thermal equilibrium plasma includes a plurality of methyl radicals. The method includes ion-bombarding the glass material with at least the methyl radicals to create an interphase region. The method includes forming a plurality of FLG nanoplatelets within the interphase region based on recombination or self-nucleation of the methyl radicals. The FLG nanoplatelets may be dispersed throughout the interphase region in a non-periodic orientation that at least partially inhibits formation of cracks in the glass material. The method includes doping surfaces of the FLG nanoplatelets with the additive, and intercalating the additive between adjacent graphene layers within the FLG nanoplatelets formed in the glass material.

Methods for manufacturing a carbon-containing glass material are disclosed. The method includes flowing a hydrocarbon gas and silane into a reactor, and providing an additive to the reactor. The method includes generating a non-thermal equilibrium plasma based on excitement of the hydrocarbon gas and the silane by a microwave energy, where the non-thermal equilibrium plasma includes a plurality of methyl radicals. The method includes ion-bombarding the glass material with at least the methyl radicals to create an interphase region. The method includes forming a plurality of FLG nanoplatelets within the interphase region based on recombination or self-nucleation of the methyl radicals. The FLG nanoplatelets may be dispersed throughout the interphase region in a non-periodic orientation that at least partially inhibits formation of cracks in the glass material. The method includes doping surfaces of the FLG nanoplatelets with the additive, and intercalating the additive between adjacent graphene layers within the FLG nanoplatelets formed in the glass material.

Methods of forming vias in substrates having at least one damage region extending from a first surface etching the at least one damage region of the substrate to form a via in the substrate, wherein the via extends through the thickness T of the substrate while the first surface of the substrate is masked. The mask is removed from the first surface of the substrate after etching and upon removal of the mask the first surface of the substrate has a surface roughness (Rq) of about less than 1.0 nm.

The present disclosure provides a method for coating a composite structure comprising the steps of applying a first slurry of a first phosphate glass composition on an outer surface of the composite structure. The first slurry comprises a first additive including at least one of molybdenum disulfide or tungsten disulfide. The method may further include heating the composite structure to a temperature sufficient to form a base layer adhered to the composite structure.

The present disclosure provides a method for coating a composite structure comprising the steps of applying a first slurry of a first phosphate glass composition on an outer surface of the composite structure. The first slurry comprises a first additive including at least one of molybdenum disulfide or tungsten disulfide. The method may further include heating the composite structure to a temperature sufficient to form a base layer adhered to the composite structure.

Embodiments of methods for forming strengthened glass articles comprise providing an exchangeable glass substrate having a coefficient of thermal expansion (CTE) between about 60×10-7/° C. to about 110×10-7/° C., depositing at least one decorative porous inorganic layer onto at least a portion of the surface of the glass substrate, wherein the decorative porous inorganic layer comprises a glass transition temperature (Tg)≥450° C., a glass softening temperature (Ts)≤650° C., wherein the difference in CTE values between the glass substrate and the decorative porous inorganic layer is within 10×10-7/° C.; and curing the glass substrate and the deposited decorative porous inorganic layer at a temperature greater than the Ts of the decorative porous inorganic layer; and chemically strengthening the cured glass substrate and the decorative porous inorganic layer thereon via ion exchange at a temperature below the Tg of the decorative porous inorganic layer.

Embodiments of methods for forming strengthened glass articles comprise providing an exchangeable glass substrate having a coefficient of thermal expansion (CTE) between about 60×10-7/° C. to about 110×10-7/° C., depositing at least one decorative porous inorganic layer onto at least a portion of the surface of the glass substrate, wherein the decorative porous inorganic layer comprises a glass transition temperature (Tg)≥450° C., a glass softening temperature (Ts)≤650° C., wherein the difference in CTE values between the glass substrate and the decorative porous inorganic layer is within 10×10-7/° C.; and curing the glass substrate and the deposited decorative porous inorganic layer at a temperature greater than the Ts of the decorative porous inorganic layer; and chemically strengthening the cured glass substrate and the decorative porous inorganic layer thereon via ion exchange at a temperature below the Tg of the decorative porous inorganic layer.

In some embodiments, an electrode can include a current collector, a composite material in electrical communication with the current collector, and at least one phase configured to adhere the composite material to the current collector. The current collector can include one or more layers of metal, and the composite material can include electrochemically active material. The at least one phase can include a compound of the metal and the electrochemically active material. In some embodiments, a composite material can include electrochemically active material. The composite material can also include at least one phase configured to bind electrochemically active particles of the electrochemically active material together. The at least one phase can include a compound of metal and the electrochemically active material.

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO.sub.2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO.sub.2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO.sub.2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m.sup.2/g. A device for carrying out the method is also provided.

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO.sub.2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO.sub.2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO.sub.2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m.sup.2/g. A device for carrying out the method is also provided.