The invention a ward for improving health belongs to the ward field. The ward includes glass window, characterized in that all or part of the glass window has glass structure which can be penetrated through by UVB, and the glass structure is a controllable glass structure, the controllable glass structure is a glass structure, of which UVB transmission amount is controllable. It's verified that, the ward of the invention can make patients get sufficient UVB exposure so as to meet the needs of synthesis of vitamin D in organism in the limited time, compared to ordinary ward and regular outdoor sunlight, the effect of vitamin D synthesis is better, and patients don't need to walk, which is very convenient for bedridden or disabled patients.

An energy-saving glass includes a glass substrate, and a periodic metal layer deposited on the glass substrate and having a honeycomb array of round holes. A method of manufacturing the energy-saving glass includes: providing a template having multiple template spots arranged in a honeycomb array; forming on the template a transfer metal layer having multiple metal spots disposed respectively on the template spots; transferring the metal spots onto a photoresist layer on a glass substrate; etching the photoresist layer exposed from the metal spots to leave photoresist spots underlying the metal spots on the glass substrate; forming a periodic metal layer around the photoresist spots; and removing the photoresist spots.

Provided is a silica glass member which exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.010.sup.7/K or less at near room temperature, particularly a silica glass member which is suitable as a photomask substrate to be used in a double patterning exposure process using an ArF excimer laser (193 nm) as a light source. The silica glass member is used in a photolithography process using a vacuum ultraviolet light source, in which the fluorine concentration is 1 wt % or more and 5 wt % or less, and the thermal expansion coefficient at from 20 C. to 50 C. is 4.010.sup.7/K or less.

A low infrared absorbing lithium glass includes FeO in the range of 0.0005-0.015 wt. %, more preferably 0.001-0.010 wt. %, and a redox ratio in the range of 0.005-0.15, more preferably in the range of 0.005-0.10. The glass can be chemically tempered and used to provide a ballistic viewing cover for night vision goggles or scope. A method is provided to change a glass making process from making a high infrared absorbing lithium glass having FeO in the range of 0.02 to 0.04 wt. % and a redox ratio in the range of 0.2 to 0.4 to the low infrared absorbing lithium glass by adding additional oxidizers to the batch materials. A second method is provided to change a glass making process from making a low infrared absorbing lithium glass to the high infrared absorbing lithium glass by adding additional reducers to the batch material. In one embodiment of the invention the oxidizer is CeO.sub.2. An embodiment of the invention covers a glass made according to the method.

A low CTE boro-aluminosilicate glass having a low brittleness for use in wafer-level-packaging (WLP) applications is disclosed. The glass comprises a composition in mol-% of SiO.sub.2: 60-85, Al.sub.2O.sub.3: 1-17, B.sub.2O.sub.3: 8-20, Na.sub.2O: 0-5, K.sub.2O: 0-5, MgO: 0-10, CaO: 0-10, SrO: 0-10, and BaO: 0-10. An average number of non-bridging oxygen per polyhedron (NBO) is equal to or larger than 0.2 and a ratio B.sub.2O.sub.3/Al.sub.2O.sub.3 is equal to or larger than 0.5. The NBO is defined as NBO=2O.sub.mol/(Si.sub.mol+Al.sub.mol+B.sub.mol)4. A glass carrier wafer made from the low CTE boro-aluminosilicate glass and a use thereof as a glass carrier wafer for the processing of a silicon substrate are also disclosed, as well as a method for providing a low CTE boro-aluminosilicate glass.

On an EUV light-reflecting surface of titania-doped quartz glass, an angle () included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

An alkali-free glass having a strain point of 650? C. or more, an average coefficient of thermal expansion at 50 to 350? C. of from 30?10.sup.?7 to 45?10.sup.?7/? C., and a temperature T.sub.2 at which a glass viscosity reaches 10.sup.2 dPa.Math.s of from 1,500 to 1,800? C. The alkali-free glass contains, as represented by mol % based on oxides, SiO.sub.2: from 62 to 70%, Al.sub.2O.sub.3: from 9 to 16% B.sub.2O.sub.3: from 0 to 12%, MgO: from 3 to 10%, CaO: from 4 to 12%, SrO: from 0 to 6%, and Fe.sub.2O.sub.3: from 0.001 to 0.04%, provided that MgO+CaO+SrO+BaO is from 12 to 25%. The alkali-free glass has a ?-OH value of from 0.35 to 0.85/mm.

An ultraviolet light transmitting glass contains, in molar percentage on an oxide basis, 55% or more and 80% or less of SiO.sub.2; 12% or more and 27% or less of B.sub.2O.sub.3; 4% or more and 20% or less of R.sub.2O in total, where R represents at least one alkali metal selected from a group consisting of Li, Na, and K; 0% or more and 5% or less of Al.sub.2O.sub.3; 0% or more and 5% or less of RO in total, where R represents at least one alkaline earth metal selected from a group consisting of Mg, Ca, Sr, and Ba; 0% or more and 5% or less of ZnO; and 1.5% or more and 20% or less of ZrO.sub.2. The ultraviolet light transmitting glass with a thickness of 0.5 mm has a transmittance of 70% or more at a wavelength of 254 nm.

Provided is a glass material that can satisfy both high Faraday effect and high light transmittance at wavelengths used. A glass material containing, in terms of % by mole of oxide, more than 40% Tb.sub.2O.sub.3 and having a percentage of Tb.sup.3+ of 55% by mole or more relative to a total content of Tb.

A support glass substrate of the present invention is a support glass substrate for supporting a substrate to be processed, the support glass substrate including, as a glass composition, in terms of mol %, 50% to 80% of SiO.sub.2, 0% to 25% of Al.sub.2O.sub.3, 5.5% to 20% of B.sub.2O.sub.3, 0% to 5% of Li.sub.2O+Na.sub.2O+K.sub.2O, 0% to 15% of MgO, 1% to 25% of CaO, 0% to 10% of SrO, and 0% to 10% of BaO, having a molar ratio (MgO+SrO+BaO)/CaO of 1.5 or less, and having an average coefficient of thermal expansion at from 30 C. to 380 C. of from 3510.sup.7/ C. to 6010.sup.7/ C.