C03C4/04

Low Insertion Loss RF Transmission Line
20200168976 · 2020-05-28 ·

The present invention includes a method of creating electrical air gap or other low loss low cost RF mechanically and thermally stabilized interdigitated resonate filter in photo definable glass ceramic substrate. A ground plane may be used to adjacent to or below the RF filter in order to prevent parasitic electronic signals, RF signals, differential voltage build up and floating grounds from disrupting and degrading the performance of isolated electronic devices by the fabrication of electrical isolation and ground plane structures on a photo-definable glass substrate.

2D and 3D inductors antenna and transformers fabricating photoactive substrates

A method of fabrication and device made by preparing a photosensitive glass substrate comprising at least silica, lithium oxide, aluminum oxide, and cerium oxide, masking a design layout comprising one or more holes to form one or more electrical conduction paths on the photosensitive glass substrate, exposing at least one portion of the photosensitive glass substrate to an activating energy source, exposing the photosensitive glass substrate to a heating phase of at least ten minutes above its glass transition temperature, cooling the photosensitive glass substrate to transform at least part of the exposed glass to a crystalline material to form a glass-crystalline substrate and etching the glass-crystalline substrate with an etchant solution to form one or more angled channels that are then coated.

PHOTOSENSITIVE GLASS

The present invention relates to a photosensitive glass in which a Li.sub.2SiO.sub.3 crystal is precipitated by exposure and heat treatment, in which the photosensitive glass has a value of Formula (A) described below of 0.50 or more and 0.75 or less, and the photosensitive glass has a dielectric loss tangent at 20? C. and 10 GHz of 0.0090 or less, [Li.sub.2O]/([Li.sub.2O]+[Na.sub.2O]+[K.sub.2O]) Formula (A), in Formula (A), [Li.sub.2O], [Na.sub.2O], and [K.sub.2O] respectively indicate contents of Li.sub.2O, Na.sub.2O, and K.sub.2O in the photosensitive glass in terms of mole percentage based on oxides.

PHOTOSENSITIVE GLASS

The present invention relates to a photosensitive glass in which a Li.sub.2SiO.sub.3 crystal is precipitated by exposure and heat treatment, in which the photosensitive glass has a value of Formula (A) described below of 0.50 or more and 0.75 or less, and the photosensitive glass has a dielectric loss tangent at 20? C. and 10 GHz of 0.0090 or less, [Li.sub.2O]/([Li.sub.2O]+[Na.sub.2O]+[K.sub.2O]) Formula (A), in Formula (A), [Li.sub.2O], [Na.sub.2O], and [K.sub.2O] respectively indicate contents of Li.sub.2O, Na.sub.2O, and K.sub.2O in the photosensitive glass in terms of mole percentage based on oxides.

2D and 3D inductors fabricating photoactive substrates

A method of fabrication and device made by preparing a photosensitive glass substrate comprising at least silica, lithium oxide, aluminum oxide, and cerium oxide, masking a design layout comprising one or more holes to form one or more electrical conduction paths on the photosensitive glass substrate, exposing at least one portion of the photosensitive glass substrate to an activating energy source, exposing the photosensitive glass substrate to a heating phase of at least ten minutes above its glass transition temperature, cooling the photosensitive glass substrate to transform at least part of the exposed glass to a crystalline material to form a glass-crystalline substrate and etching the glass-crystalline substrate with an etchant solution to form one or more angled channels that are then coated.

Method for producing photo-structurable glass bodies by a redrawing method

A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si.sup.4+, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na.sup.+, K.sup.+, Li.sup.+, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al.sup.3+, B.sup.3+, Zn.sup.2+, Sr.sup.2+, Sb.sup.3+, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Si.sup.4+ that is at least 0.3 and at most 0.85.

Method for producing photo-structurable glass bodies by a redrawing method

A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si.sup.4+, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na.sup.+, K.sup.+, Li.sup.+, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al.sup.3+, B.sup.3+, Zn.sup.2+, Sr.sup.2+, Sb.sup.3+, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Si.sup.4+ that is at least 0.3 and at most 0.85.

Sensitized, photo-sensitive glass and its production

A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si.sup.4+, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Sensitized, photo-sensitive glass and its production

A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si.sup.4+, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Glass based empty substrate integrated waveguide devices

The present invention includes a method of creating high Q empty substrate integrated waveguide devices and/or system with low loss, mechanically and thermally stabilized in photodefinable glass ceramic substrate. The photodefinable glass ceramic process enables high performance, high quality, and/or low-cost structures. Compact low loss RF empty substrate integrated waveguide devices are a cornerstone technological requirement for RF systems, in particular, for portable systems.