A glass material with a low dielectric constant and a low fiberizing temperature includes silicon dioxide, boron trioxide, aluminum oxide, calcium oxide, phosphorus pentoxide and zinc oxide. The silicon dioxide makes up 45%-52% by weight of the glass material. The boron trioxide makes up 25%-30% by weight of the glass material. The aluminum oxide makes up 10%-14% by weight of the glass material. The calcium oxide makes up 1%-4% by weight of the glass material. The phosphorus pentoxide makes up 0-3% by weight of the glass material. The zinc oxide makes up 1%-5% by weight of the glass material. The reduced silicon dioxide content and calcium oxide content and addition of phosphorus pentoxide and zinc oxide in the glass material lower the dielectric constant and fiberizing temperature of the glass material.

A glass-ceramic includes SiO.sub.2 in a range of 40 mol. % to 80 mol. %; Al.sub.2O.sub.3 in a range of 5 mol. % to 20 mol. %; MgO in a range of 5 mol. % to 20 mol. %; and at least one of B.sub.2O.sub.3, ZnO, and TiO.sub.2, each in a range of 0 mol. % to 10 mol. %, such that the glass-ceramic further comprises a magnesium aluminosilicate crystalline phase at a concentration in a range of 5 wt. % to 80 wt. % of the glass-ceramic.

A glass-ceramic includes SiO.sub.2 in a range of 40 mol. % to 80 mol. %; Al.sub.2O.sub.3 in a range of 5 mol. % to 20 mol. %; MgO in a range of 5 mol. % to 20 mol. %; and at least one of B.sub.2O.sub.3, ZnO, and TiO.sub.2, each in a range of 0 mol. % to 10 mol. %, such that the glass-ceramic further comprises a magnesium aluminosilicate crystalline phase at a concentration in a range of 5 wt. % to 80 wt. % of the glass-ceramic.

A glass material with low viscosity and a low bubble content attributable to a low weight percentage of silicon dioxide includes boron trioxide (B.sub.2O.sub.3), magnesium oxide (MgO), aluminum oxide (Al.sub.2O.sub.3), and calcium oxide (CaO) in addition to silicon dioxide (SiO.sub.2); wherein Silicon dioxide (SiO.sub.2) constitutes 45%-51% by weight of the glass material, boron trioxide (B.sub.2O.sub.3) 25%-35%, magnesium oxide (MgO) 0.01%-2%, aluminum oxide (Al.sub.2O.sub.3) 10%-14.5%, and calcium oxide (CaO) 4%-10%. As the silicon dioxide (SiO.sub.2) content is lower than in the prior art, the glass material has lower viscosity, and hence a lower bubble content, than in the prior art, and this allows products made of the glass material to have a higher yield than products made of the conventional glass.

A borosilicate glass includes, in terms of molar percentage based on oxides: 70.0%≤SiO.sub.2≤85.0%; 5.0%≤B.sub.2O.sub.3≤20.0%; 0.0%≤Al.sub.2O.sub.3≤3.0%; 0.0%≤Li.sub.2O≤5.0%; 0.0%≤Na.sub.2O≤5.0%; 0.0%≤K.sub.2O≤5.0%; 0.0%≤MgO≤5.0%; 0.0%≤CaO≤5.0%; 0.0%≤SrO≤5.0%; 0.0%≤BaO≤5.0%; and 0.06%≤Fe.sub.2O.sub.3≤1.0%, in which the borosilicate glass has a basicity of 0.485 or more, and [AlO.sub.3]/([SiO.sub.2]+[B.sub.2O.sub.3]) of 0.015 or less.

A borosilicate glass includes, in terms of molar percentage based on oxides: 70.0%≤SiO.sub.2≤85.0%; 5.0%≤B.sub.2O.sub.3≤20.0%; 0.0%≤Al.sub.2O.sub.3≤3.0%; 0.0%≤Li.sub.2O≤5.0%; 0.0%≤Na.sub.2O≤5.0%; 0.0%≤K.sub.2O≤5.0%; 0.0%≤MgO≤5.0%; 0.0%≤CaO≤5.0%; 0.0%≤SrO≤5.0%; 0.0%≤BaO≤5.0%; and 0.06%≤Fe.sub.2O.sub.3≤1.0%, in which the borosilicate glass has a basicity of 0.485 or more, and [AlO.sub.3]/([SiO.sub.2]+[B.sub.2O.sub.3]) of 0.015 or less.

The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40≤SiO.sub.2≤60, 25≤B.sub.2O.sub.3≤45, 0<Al.sub.2O.sub.3≤18, 0<R.sub.2O≤5, and 0≤RO≤12, and satisfies at least one of: i) SiO.sub.2+B.sub.2O.sub.3≥80 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9; and ii) SiO.sub.2+B.sub.2O.sub.3≥78, SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9, and 0<RO<10. Another glass composition provided includes SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, R.sub.2O, and 3<RO<8 at the same contents as the above, and satisfies SiO.sub.2+B.sub.2O.sub.3≥75 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3<97, where R.sub.2O═Li.sub.2O+Na.sub.2O+K.sub.2O and RO═MgO+CaO+SrO.

The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40≤SiO.sub.2≤60, 25≤B.sub.2O.sub.3≤45, 0<Al.sub.2O.sub.3≤18, 0<R.sub.2O≤5, and 0≤RO≤12, and satisfies at least one of: i) SiO.sub.2+B.sub.2O.sub.3≥80 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9; and ii) SiO.sub.2+B.sub.2O.sub.3≥78, SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9, and 0<RO<10. Another glass composition provided includes SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, R.sub.2O, and 3<RO<8 at the same contents as the above, and satisfies SiO.sub.2+B.sub.2O.sub.3≥75 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3<97, where R.sub.2O═Li.sub.2O+Na.sub.2O+K.sub.2O and RO═MgO+CaO+SrO.

A multilayer coil component includes a component element assembly in which an inner conductor is disposed and an outer electrode disposed on the surface of the component element assembly. The component element assembly includes a first dielectric glass layer in which the inner conductor is embedded and second dielectric glass layers that are thin layers disposed on respective principal surfaces of the first dielectric glass layer. The primary component of each of the first dielectric glass layer and the second dielectric glass layers is formed of a glass material and has a filler component containing at least quartz, and the second dielectric glass layers have a lower quartz content than the first dielectric glass layer.

A multilayer coil component includes a component element assembly in which an inner conductor is disposed and an outer electrode disposed on the surface of the component element assembly. The component element assembly includes a first dielectric glass layer in which the inner conductor is embedded and second dielectric glass layers that are thin layers disposed on respective principal surfaces of the first dielectric glass layer. The primary component of each of the first dielectric glass layer and the second dielectric glass layers is formed of a glass material and has a filler component containing at least quartz, and the second dielectric glass layers have a lower quartz content than the first dielectric glass layer.