A method of manufacturing a microarray substrate having improved reliability and mass-production properties uses a vapor of a surface-reforming material, and includes washing a base substrate, supplying the vapor of the surface-reforming material into a container to which the base substrate is provided, and coupling the vapor of the surface-reforming material to a surface of the base substrate to form a self-assembled monolayer.

The present disclosure provides a polarizer and fabrication method thereof. The polarizer includes a substrate made of transparent material and a first polarizing layer formed on the substrate having an optical alignment direction after being exposed to a polarized ultraviolet light. The substrate is the only substrate in the polarizer, and no additional substrate is configured on the polarizing layer.

The present disclosure provides a polarizer and fabrication method thereof. The polarizer includes a substrate made of transparent material and a first polarizing layer formed on the substrate having an optical alignment direction after being exposed to a polarized ultraviolet light. The substrate is the only substrate in the polarizer, and no additional substrate is configured on the polarizing layer.

Solutions suitable for etch cutting glass substrates are disclosed. The solutions can include: (a) about 20.1 to about 25 weight % of hydrofluoric acid; (b) about 7 to about 10.5 weight % of an organic carboxylic acid; (c) 0 to about 10 weight % of nitric acid; and (d) about 54.5 to about 72.9 weight % of water; wherein the weight % is based on the total weight of the etch cutting solution.

Transfer films, articles made therewith, and methods of making and using transfer films that include antireflective structures are disclosed.

Transfer films, articles made therewith, and methods of making and using transfer films that include antireflective structures are disclosed.

Provided is a top plate for a cooking device including a glass sheet (2) and a light-shielding film (3) formed on a lower surface (2c) of the glass sheet (2) through sputtering. The light-shielding film (3) contains an oxide, a nitride, or an oxynitride of a transition metal of Group 6 to Group 11 on the periodic table. In this manner, a color close to grey can be achieved as a color of the light-shielding film (3) while insulating properties of the light-shielding film (3) are secured.

A method for producing a glass substrate according to the present invention includes the steps of: (I) forming a through hole (11) in a glass sheet (10); (II) forming a resin layer (20) on a first principal surface of the glass sheet (10) using a resin composition sensitive to light having a predetermined wavelength λ.sub.1; (III) photoexposing an area of the resin layer (20) that covers the through hole (11) by irradiating the area with light U having the wavelength λ.sub.1 and applied from the direction of a second principal surface of the glass sheet (10); and (IV) forming a through-resin hole (21) by removing the area photoexposed in the step (III). The glass sheet (10) protects the resin layer (20) from the light U so as to prevent the resin layer (20) from being photoexposed by beams of the light U that are incident on the second principal surface of the glass sheet (10) in the step (III).

A method for producing a glass substrate according to the present invention includes the steps of: (I) forming a through hole (11) in a glass sheet (10); (II) forming a resin layer (20) on a first principal surface of the glass sheet (10) using a resin composition sensitive to light having a predetermined wavelength λ.sub.1; (III) photoexposing an area of the resin layer (20) that covers the through hole (11) by irradiating the area with light U having the wavelength λ.sub.1 and applied from the direction of a second principal surface of the glass sheet (10); and (IV) forming a through-resin hole (21) by removing the area photoexposed in the step (III). The glass sheet (10) protects the resin layer (20) from the light U so as to prevent the resin layer (20) from being photoexposed by beams of the light U that are incident on the second principal surface of the glass sheet (10) in the step (III).

Glass substrates comprising an A-side upon which silicon thin film transistor devices can be fabricated and a B-side having a substantially homogeneous organic film thereon are described. The organic film includes a moiety that reduces voltage generation by contact electrification or triboelectrification. Methods of manufacturing the glass substrates and example devices incorporating the glass substrates are also described.