C03C23/0005

ARTICLES AND METHODS OF FORMING VIAS IN SUBSTRATES
20190348301 · 2019-11-14 ·

Methods of forming vias in substrates having at least one damage region extending from a first surface etching the at least one damage region of the substrate to form a via in the substrate, wherein the via extends through the thickness T of the substrate while the first surface of the substrate is masked. The mask is removed from the first surface of the substrate after etching and upon removal of the mask the first surface of the substrate has a surface roughness (Rq) of about less than 1.0 nm.

Glass composition

A glass composition including 65 to 72 wt-% SiO.sub.2, at least 10.1 wt-% Li.sub.2O, at least 10.1 wt-% Al.sub.2O.sub.3, 0 to 2 wt-% K.sub.2O, at most 4 wt-% Na.sub.2O, 0 to 1.5 wt-% CaO, 0 to 1.5 wt-% CeO.sub.2, 1 to 5 wt-% P.sub.2O.sub.5, 0 to 0.5 wt-% V.sub.2O.sub.5, 0 to 1 wt-% Ag, and 0 to 1 wt-% ZrO.sub.2, based on a total weight of the composition. The composition is devoid of TiO.sub.2, Cu.sub.2O, BaO, Sb.sub.2O.sub.3, Nb.sub.2O.sub.5, MgO, La.sub.2O.sub.3, and SnO.sub.2. The proportion of Li.sub.2O to Al.sub.2O.sub.3 in the composition is in a range of from 1:1 to 1.5:1.

Articles and methods of forming vias in substrates
10410883 · 2019-09-10 · ·

Methods of forming vias in substrates having at least one damage region extending from a first surface etching the at least one damage region of the substrate to form a via in the substrate, wherein the via extends through the thickness T of the substrate while the first surface of the substrate is masked. The mask is removed from the first surface of the substrate after etching and upon removal of the mask the first surface of the substrate has a surface roughness (Rq) of about less than 1.0 nm.

Method, system, and equipment for glass material processing as a function of crystal state

A method of processing a glass material includes guiding and/or focusing light from a light source to glass material in a hot stage of a processing system, where the light source provides light at a wavelength that interacts with crystals that may be formed in the glass material. The method includes collecting and/or guiding light directed from the glass material in the hot stage to a wavelength separator, and separating the light directed from the glass material to provide a spectrum having wavelengths that are within about twenty nanometers of the wavelength . The method includes observing with a detector light of the spectrum to identify nano-scale shifts in the wavelength caused by interaction with crystals, if present, within the glass material in the hot stage of the processing system.

Methods for making high density vias in a glass article
12103888 · 2024-10-01 · ·

A method for forming a via in a glass article includes forming one or more cavities within a glass substrate by exposing the glass substrate to an etchant, the glass substrate including a glass cladding layer and a glass central core layer, where the glass cladding layer has an etch rate in the etchant that is different than an etch rate of the glass central core layer, and where the one or more cavities extend through the glass central core layer terminating at the glass cladding layer, depositing a metallic material within the one or more cavities, and removing the glass cladding layer.

STRUCTURAL BODY, STRUCTURAL BODY MANUFACTURING METHOD, AND PRECURSOR COMPOSITION
20240336517 · 2024-10-10 ·

An object is to provide a structural body having high light transmissivity and a high degree of freedom in shape, a manufacturing method for the structural body, and a precursor composition used in the manufacturing method.

A structural body according to an embodiment of the present disclosure includes a plurality of nanoparticles, the plurality of nanoparticles being directly covalent-bonded to each other without interposing an additive component other than the plurality of nanoparticles.

Systems and methods for display formation using photo-machinable material substrate layers

Embodiments are related to scalable surface structure (e.g., a well or other structure) formation in a substrate and, more particularly, to systems and methods for forming displays using a photo-machinable material layer.

Fabricating highly durable nanostructured coatings on polymer substrate
09981871 · 2018-05-29 · ·

A method of forming a coating that includes depositing a multicomponent glass layer on a polymer substrate and depositing a heat absorbing layer on the multicomponent glass layer. Inducing spinodal decomposition of the multicomponent glass layer by annealing the heat absorbing layer, and etching at least one of a phase separated component of the multicomponent glass layer. The spinodal decomposition may be achieved through a pulse thermal or electromagnetic assisted annealing process. The coating may then be used as a hydrophilic surface, or may be fluorinated using conventional methods to produce the superhydrophobic coating.

METHOD FOR OBTAINING A SUBSTRATE COATED WITH A FUNCTIONAL LAYER BY USING A SACRIFICIAL LAYER

The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent,

said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.

GLASS COMPOSITION

A glass composition including 65 to 72 wt-% SiO.sub.2, at least 10.1 wt-% Li.sub.2O, at least 10.1 wt-% Al.sub.2O.sub.3, 0 to 2 wt-% K.sub.2O, at most 4 wt-% Na.sub.2O, 0 to 1.5 wt-% CaO, 0 to 1.5 wt-% CeO.sub.2, 1 to 5 wt-% P.sub.2O.sub.5, 0 to 0.5 wt-% V.sub.2O.sub.5, 0 to 1 wt-% Ag, and 0 to 1 wt-% ZrO.sub.2, based on a total weight of the composition. The composition is devoid of TiO.sub.2, Cu.sub.2O, BaO, Sb.sub.2O.sub.3, Nb.sub.2O.sub.5, MgO, La.sub.2O.sub.3, and SnO.sub.2. The proportion of Li.sub.2O to Al.sub.2O.sub.3 in the composition is in a range of from 1:1 to 1.5:1.