Patent classifications
C
C03
C03C
2203/00
C03C2203/20
C03C2203/20
SINTER-FREE LOW-TEMPERATURE 3D-PRINTING OF NANOSCALE OPTICAL GRADE FUSED SILICA GLASS
20250313502
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2025-10-09
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A method for fabricating glass structures on a substrate includes a step of contacting the substrate with a liquid reactive composition that includes a silsesquioxane, an acrylic oligomer or monomer, and a photoinitiator. The silsesquioxane and the acrylic oligomer or monomer are each independently functionalized with at least two acrylate groups. Light is directed to the substrate such that the reactive composition forms polymeric coating on the substrate. The polymeric coating is heat treated in an oxygen-containing gas environment at a sufficiently high temperature to convert the partially cured coating to a glass, the sufficiently high temperature being lower than the melting point of the substrate.