A process for the production of a fluorinated quartz glass including the steps of generating SiO.sub.2 particles in a synthesis burner; depositing the resulting SiO.sub.2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to ?10? C. is supplied to the synthesis burner.

In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates (51) or reflective optical elements (50), in particular for EUV lithography, with substrates (51) of this type, are proposed. These substrates (51), which have a surface region (511) with a reflective coating (54), are characterised in that, at least near to the surface region (511), the titanium-doped quartz glass has a proportion of SiOOSi bonds of at least 1*10.sup.16/cm.sup.3 and/or a proportion of SiSi bonds of at least 1*10.sup.16/cm.sup.3 or, along a notional line (513) perpendicular to the surface region (511), over a length (517) of 500 nm or more, a hydrogen content of more than 5?10.sup.18 molecules/cm.sup.3.

A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.

A porous glass base material manufacturing system that does not require the manufacturing apparatus and building to be hazardous material-compatible and that can provide a stable supply of raw materials, even when organic siloxane raw material is used as raw materials to produce silica fine particles includes a raw material supplying apparatus and a porous glass base material manufacturing apparatus. The raw material supplying apparatus includes: a raw material tank in which organic siloxane raw material in a liquid state is stored and the remaining space is filled with inert gas; a liquid feed pump to pump the organic siloxane raw material from the raw material tank; a circulating piping and a branch piping through which the raw material pumped is passed; a liquid mass flow controller that controls the flow rate of organic siloxane raw material passed through the branch piping to a predetermined flow rate; and a vaporizer.

A radiation-resistant laser optical fiber preform core rod at least includes one type of activated ion (Yb.sup.3+, Er.sup.3+) and one or more types of co-doped ion (Al.sup.3+, P.sup.5+, Ge.sup.4+, Ce.sup.3+, F.sup.?), and OD group of 16-118 ppm. Irradiation resistance of core rod glass can be effectively improved by sequentially performing pre-treatments, i.e. deuterium loading, pre-irradiation and thermal annealing on a preform core rod. Electron paramagnetic resonance test shows that, under the same radiation condition, the radiation induced color center concentration in a preform core rod treated by the method above is lower than in an untreated core rod by one or more orders of magnitude. The obtained core rod can be used for preparing a radiation-resistant rare earth-doped silica fiber, and has the advantages of high laser slope efficiency, low background loss, being able to be used stably in a vacuum environment for a long time, for example.

An optical glass includes La.sup.3+, Zn.sup.2+, Nb.sup.5+, and Ti.sup.4+ as a cation configuring glass. La.sup.3+, Zn.sup.2+, Nb.sup.5+, and Ti.sup.4+ which satisfy 10 cat %La.sup.3+20 cat %, 10 cat %Zn.sup.2+60 cat %, 20 cat %Nb.sup.5+60 cat %, and 0 cat %Ti.sup.4+40 cat % expressed by cation %.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing silicon dioxide particles, ii.) Making a glass melt out of the silicon dioxide particles in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0 C. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

One aspect is a process for the preparation of a quartz glass body including providing a silicon dioxide granulate wherein the provision includes providing silicon dioxide powder, and processing the silicon dioxide powder to obtain a silicon dioxide granulate. The silicon dioxide granulate has a larger particle diameter than the silicon dioxide powder. The processing includes processing the silicon dioxide powder to obtain a silicon dioxide granulate I, wherein the silicon dioxide granulate I has a first carbon content wC(1), treating the silicon dioxide granulate I with a reactant to obtain a silicon dioxide granulate II with a further carbon content wC(2), wherein the further carbon content wC(2) is less than the first carbon content wC(1), making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt.

One aspect relates to a process for the provision of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in an oven and making a quartz glass body from at least part of the glass melt. The oven includes a hanging metal sheet crucible. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body which are obtainable by processing the quartz glass body further.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.