The present invention relates to glasses having a composition made up of base glasses. The glasses have a good chemical toughenability in combination with an advantageous coefficient of thermal expansion. Owing to their composition and the production process, the homogeneity of the properties of the glasses at their surface is high compared to the bulk glass. Furthermore, the fragility of the glasses is low, so that they can be processed to produce very thin glass articles.

A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.

The present disclosure provides a strengthened glass and a glass strengthening method, and an electronic device housing. Two opposing sides of the strengthened glass have surface compressive stress layers, and a third stress layer is sandwiched between the two surface compressive stress layers. The third stress layer includes a compressive stress region and multiple tensile stress regions spaced apart within the compressive stress region, the multiple tensile stress regions are extended in a thickness direction of the strengthened glass, and each of the tensile stress regions is surrounded by the compressive stress region. A sum of thicknesses of the surface compressive stress layers and a thickness of the compressive stress region located between two adjacent tensile stress regions is equal to a thickness of the strengthened glass.

A method for manufacturing an annular glass substrate includes: forming, on a glass blank, a separation line that includes a plurality of defects along a predetermined circle by irradiating a surface of the glass blank with a laser beam along the circle; and separating a portion outside the separation line of the glass blank on which the separation line was formed from a portion inside the separation line by heating the portion outside the separation line at a higher temperature than the portion inside the separation line. The separation line includes: a first region in which the defects are periodically formed and an interval between a pair of adjacent defects is a first interval; and a second region in which an interval between a pair of adjacent defects is shorter than the first interval.

A method for producing reinforced glass, reinforced glass and an electronic device are provided. The method for producing reinforced glass includes: subjecting glass to a first reinforcing treatment; detecting a first stress parameter of the glass subjected to the first reinforcing treatment, and determining whether the glass subjected to the first reinforcing treatment is qualified according to the first stress parameter; subjecting the glass to a second reinforcing treatment when the glass subjected to the first reinforcing treatment is qualified; detecting a second stress parameter of the glass subjected to the second reinforcing treatment, and determining whether the glass subjected to the second reinforcing treatment is qualified according to the second stress parameter; and subjecting the glass to a touch-polishing treatment when the glass subjected to the second reinforcing treatment is qualified, so as to obtain the reinforced glass.

A chemically toughenable or toughened glass has, before chemical toughening, a thickness t of at most 1100 ?m. The glass comprises the following components: 45-75 mol-% SiO.sub.2; 10-25 mol-% Al.sub.2O.sub.3; >1-11 mol-% Li.sub.2O; 0-15 mol-% P.sub.2O.sub.5; 0-8 mol-% B.sub.2O.sub.3; and 0-5 mol-% TiO.sub.2. The average number of bridging oxygen per polyhedron (BO) calculated as 2*4?2*(c.sub.mol(O)/(c.sub.mol(Si)+c.sub.mol(Al)+c.sub.mol(B)+c.sub.mol(P)+c.sub.mol(Ti))) is higher than 3.55. Upon chemical toughening, the linear dimension variation in the unit of percentage (V.sub.1) is so low that the overall geometry variation (OGV) calculated as (DoL/t)/V.sub.1 is higher than 0.8. DoL is the total depth of all ion-exchange layers on one side of the glass and DoL is more than 1 ?m, when the glass is chemically toughened with NaNO.sub.3 only, KNO.sub.3 only or with both KNO.sub.3 and NaNO.sub.3.

A structure can comprise a substrate and a composite coating. The composite coating can be formed over a surface of the substrate. The composite coating can include one or more nanoparticles within an oxide matrix. The nanoparticles can be formed of a temperature-dependent Mott insulator having a phase transition temperature. At a temperature below the phase transition temperature, the composite coating can transmit light in a first wavelength range, and at a temperature above the phase transition temperature, the composite coating can block light in the first wavelength range. For example, the structure can be used as a smart 10 window to help regulate heating of building interiors due to solar radiation. The composite coating can be formed via a short-duration, high-temperature heating pulse, for example, at least 1500 K for less than 60 seconds.

One aspect is a process for the preparation of a quartz glass body including providing a silicon dioxide granulate wherein the provision includes providing silicon dioxide powder, and processing the silicon dioxide powder to obtain a silicon dioxide granulate. The silicon dioxide granulate has a larger particle diameter than the silicon dioxide powder. The processing includes processing the silicon dioxide powder to obtain a silicon dioxide granulate I, wherein the silicon dioxide granulate I has a first carbon content wC(1), treating the silicon dioxide granulate I with a reactant to obtain a silicon dioxide granulate II with a further carbon content wC(2), wherein the further carbon content wC(2) is less than the first carbon content wC(1), making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt.

One aspect relates to a process for the provision of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in an oven and making a quartz glass body from at least part of the glass melt. The oven includes a hanging metal sheet crucible. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body which are obtainable by processing the quartz glass body further.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.