A glass substrate comprising a rectangular glass sheet having a first main surface and a second main surface opposite the first main surface, the glass substrate having a first side and a second side which are adjacent to each other in a view along a thickness direction of the glass sheet, in which a thickness tolerance is less than 6.26 m in a first cross section which is a cross section in the thickness direction of the glass sheet along a straight line parallel to the first side, the thickness tolerance being a difference between the maximum value and the minimum value of the thickness of the glass sheet.

A substrate with a textured surface is disclosed. The textured glass substrate exhibits low haze and a significant reduction in contact electrostatic charging when compared to an un-textured but otherwise identical glass substrate. Methods of producing the textured surface by an in situ mask etching process are also disclosed.

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

A method of manufacturing and treating a glass article wherein the treatment of the article includes directing a flow of plasma, such as a flow of plasma comprising an atmospheric pressure plasma jet, toward a major surface of the article. Such treatment can reduce the absolute measured voltage on the major surface.

A glass article is provided that includes: a glass substrate comprising a thickness and a primary surface; and a textured region defined by the primary surface. The textured region comprises a plurality of sub-surface hillocks, each hillock having a top surface and a base, the base located below the primary surface of the substrate. The plurality of hillocks comprises an average lateral feature size from 0.1 m to 3 m and an average height from 5 nm to 200 nm. Further, the primary surface of the substrate is substantially planar.

A sound absorbing panel and method therefor comprising providing a first sheet of photosensitive material, applying a first mask having a first plurality of features to the first sheet of photosensitive material, exposing the masked material to ultraviolet light, heating the first sheet of photosensitive material to form crystals in exposed portions of the first sheet, and etching the crystals to form a second plurality of features in the first sheet of photosensitive material.

A method of modifying a glass substrate comprises: generating surface features with peaks and valleys on a first surface of a glass substrate, the surface features providing a roughness average (Ra) within the range of 10 nm to 2000 nm; generating a region of the glass substrate that is under compressive stress, the region extending from the first surface to a depth of compression; and removing a portion of the region under compressive stress from the first surface into the depth of compression to define a new first surface still having surface features with peaks and valleys providing a roughness average (Ra) within the range of 10 nm to 2000 nm. Removing the portion of the region under compressive stress from the first surface into the depth of the compression to define a new first surface can comprise contacting the first surface with a light etchant.

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

The present invention relates to a cover glass for a display, which is a glass plate having a first main surface and a second main surface. The cover glass contains, as represented by mol percentage based on oxides, from 50 to 75% of SiO.sub.2, from 5 to 20% of Al.sub.2O.sub.3, from 2 to 20% of Na.sub.2O, from 0 to 6% of K.sub.2O, from 0 to 15% of MgO, from 0 to 10% of a total amount (CaO+SrO+BaO) of CaO, SrO and BaO, from 0 to 5% of a total amount (ZrO.sub.2+TiO.sub.2) of ZrO.sub.2 and TiO.sub.2, from 0 to 10% of B.sub.2O.sub.3, and from 0 to 20% of Li.sub.2O. The cover glass has a ream minimum distance of 100 mm or more and 1,000 mm or less, and a ream period of 1 mm or more and 30 mm or less.

A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.