C04B41/0054

SURFACE MODIFICATION METHOD OF ZIRCONIA MATERIAL USING VACUUM PLASMA

The present invention relates to a dental 3Y-TZP zirconia material whose surface is modified by plasma treatment, an implant and a manufacturing method thereof. The 3Y-TZP zirconia material and implant manufactured according to the present invention have improved cell adhesion and antibacterial effects, thereby improving biocompatibility and minimizing inflammatory reactions of the user.

SURFACE TREATMENT OF SOLID-STATE ION CONDUCTORS

The present disclosure concerns the removal of various species from the surface of films and bilayers comprising inorganic material.

Surface treatment for aqueous slurry-based environmental barrier coating
12246343 · 2025-03-11 · ·

A method for coating a ceramic matrix composite substrate with an environmental barrier coating includes the steps of: treating a surface of a ceramic matrix composite substrate to adjust wettability of the surface; and applying an aqueous slurry-based environmental barrier coating to the surface. The treating step can be a plasma treatment to remove organic contaminants, and can also be a treatment to modify oxidative state of the surface. The treatment can produce a surface for treatment that is hydrophilic and has a contact angle with aqueous-slurry coating materials of less than 40 degrees.

Surface treatment for aqueous slurry-based environmental barrier coating
12246343 · 2025-03-11 · ·

A method for coating a ceramic matrix composite substrate with an environmental barrier coating includes the steps of: treating a surface of a ceramic matrix composite substrate to adjust wettability of the surface; and applying an aqueous slurry-based environmental barrier coating to the surface. The treating step can be a plasma treatment to remove organic contaminants, and can also be a treatment to modify oxidative state of the surface. The treatment can produce a surface for treatment that is hydrophilic and has a contact angle with aqueous-slurry coating materials of less than 40 degrees.

BINDER FOR FORMATION OF CERAMIC OR FOR USE IN CONDUCTIVE PASTE, AND USE OF SAME

There is provided a binder for ceramic formation or a conductive paste, comprising polyvinyl acetal having a degree of acetalization of from 50 to 85 mol %, a content of vinyl ester monomer unit of from 0.1 to 20 mol %, and having a viscosity-average degree of polymerization of from 200 to 5000, wherein a peak-top molecular weight (A) as measured by a differential refractive index detector and a peak-top molecular weight (B) as measured by an absorptiometer (measurement wavelength: 280 nm) in gel permeation chromatographic measurement of the polyvinyl acetal heated at 230 C. for 3 hours satisfy a formula (1) (AB)/A<0.60 and the polyvinyl acetal has an absorbance in the peak-top molecular weight (B) of from 0.5010.sup.3 to 1.0010.sup.2.

Sintered ceramic body of large dimension and method of making

A method of making a sintered ceramic body comprising the steps of disposing a ceramic powder (5) inside an inner volume of a spark plasma sintering tool (1), wherein the tool comprises: a die (2) comprising a sidewall comprising inner and outer walls, wherein the inner wall has a diameter defining the inner volume; upper and lower punches (4,4) operably coupled with the die, wherein each of the punches have an outer wall defining a diameter less than the diameter of the die inner wall, thereby creating a gap (3) between the punches and the inner wall when at least one of the punches are moved within the inner volume, and the gap is from 10 m to 70 m wide; creating vacuum conditions inside the inner volume; moving at least one of the punches to apply pressure to the ceramic powder while heating, and sintering; and lowering the temperature of the sintered body.

SINTERED CERAMIC BODY AND METHOD OF MAKING

A method of making a sintered ceramic body comprising the steps of disposing a ceramic powder inside an inner volume of a spark plasma sintering tool, wherein the tool comprises: a die comprising a sidewall comprising inner and outer walls, wherein the inner wall has a diameter defining the inner volume; upper and lower punches operably coupled with the die, wherein each of the punches have an outer wall defining a diameter less than the diameter of the die inner wall, thereby creating a gap between the punches and the inner wall when at least one of the punches are moved within the inner volume, and the gap is from 10 m to 70 m wide; creating vacuum conditions inside the inner volume; moving at least one of the punches to apply pressure to the ceramic powder while heating, and sintering; and lowering the temperature of the sintered body.

SELECTIVE ETCH OF TITANIUM CARBIDE MATERIALS USING OXIDATION

A method of dry etching a titanium carbide material of a substrate includes performing an oxidation step and a fluorination step. The oxidation step includes exposing the titanium carbide material to an oxidizing agent to form an oxidized layer including titanium oxide species and remove carbon from the titanium carbide material by forming volatilized carbon oxide species. The fluorination step includes exposing the titanium oxide species of the oxidized layer to a fluorinating agent to remove titanium from the titanium carbide material by forming volatilized fluorinated titanium oxide species. The method may be repeated as a cycle in situ within a processing chamber. The method may further include a substitution step that includes exposing a metallic fluoride species formed during the fluorination step to a substitution agent to remove metallic species from the titanium carbide material by forming volatilized metallic fluoride species.