C04B41/80

Method of manufacturing honeycomb structure
10633297 · 2020-04-28 · ·

A method of applying a circumferential coating material on a circumferential surface of a ceramic honeycomb structure to form a circumferential coat layer. The method includes vertically aligning the longitudinal axis of the ceramic honeycomb structure, rotating the ceramic honeycomb structure around the vertically-aligned longitudinal axis, and applying the circumferential coating material on the circumferential surface of the rotating honeycomb structure at a discharge speed of 50 to 120 mm/s, calculated by
Discharge speed V [mm/s]=Supplied amount q [g/s] of circumferential coating material(Density [g/mm.sup.3] of circumferential coating materialArea S [mm.sup.2] of discharge opening).

Method of manufacturing honeycomb structure
10633297 · 2020-04-28 · ·

A method of applying a circumferential coating material on a circumferential surface of a ceramic honeycomb structure to form a circumferential coat layer. The method includes vertically aligning the longitudinal axis of the ceramic honeycomb structure, rotating the ceramic honeycomb structure around the vertically-aligned longitudinal axis, and applying the circumferential coating material on the circumferential surface of the rotating honeycomb structure at a discharge speed of 50 to 120 mm/s, calculated by
Discharge speed V [mm/s]=Supplied amount q [g/s] of circumferential coating material(Density [g/mm.sup.3] of circumferential coating materialArea S [mm.sup.2] of discharge opening).

Target material for sputtering and method for manufacturing same

Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material (3, 13) is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface (5, 15) one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface (5, 15) has an arithmetic mean roughness Ra of 0.9 m or more, a maximum height Rz of 10.0 m or less, and Rz.sub.JIS roughness of 7.0 m or less. A sputtering target (1, 11) is obtained by bonding the obtained target material (3, 13) to a backing body (2, 12) by way of a bonding layer (4, 14).

Target material for sputtering and method for manufacturing same

Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material (3, 13) is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface (5, 15) one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface (5, 15) has an arithmetic mean roughness Ra of 0.9 m or more, a maximum height Rz of 10.0 m or less, and Rz.sub.JIS roughness of 7.0 m or less. A sputtering target (1, 11) is obtained by bonding the obtained target material (3, 13) to a backing body (2, 12) by way of a bonding layer (4, 14).

SYSTEMS FOR AND METHODS FOR IMPROVING MECHANICAL PROPERTIES OF CERAMIC MATERIAL
20200087216 · 2020-03-19 · ·

Systems for and methods for improving mechanical properties of ceramic material are provided. The system comprises a heat source for heating the ceramic material to a temperature greater than a brittle-to-ductile transition temperature of the ceramic material; a probe for mounting the ceramic material and configured to extend the ceramic material into the heat source; a plasma-confining medium and a sacrificial layer disposed between the ceramic material and the plasma-confining medium; and an energy pulse generator such as a laser pulse generator. The sacrificial layer is utilized to form plasma between the ceramic material and the plasma-confining medium. The method comprises heating ceramic material to a temperature greater than a brittle-to-ductile transition temperature of the ceramic material and subjecting the ceramic material to energy pulses via a sacrificial layer and a plasma-confining medium whereby a plasma of the sacrificial coating forms between the ceramic material and a plasma-confining medium.

Reversible color changeable coating composition and preparation method thereof
10544315 · 2020-01-28 · ·

Provided is a reversible color changeable coating composition and a preparation method thereof. The composition is coated on a plate and has heat resistance of 400 C. or higher thereby can be used for heating products very stably, and the durability of the plate increases since it has excellent wear resistance, chemical resistance and mechanical properties. In addition, beautiful colors can be obtained by mixing colors in various ways, and being heated can be identified with the naked eye since the color changes when heated.

Reversible color changeable coating composition and preparation method thereof
10544315 · 2020-01-28 · ·

Provided is a reversible color changeable coating composition and a preparation method thereof. The composition is coated on a plate and has heat resistance of 400 C. or higher thereby can be used for heating products very stably, and the durability of the plate increases since it has excellent wear resistance, chemical resistance and mechanical properties. In addition, beautiful colors can be obtained by mixing colors in various ways, and being heated can be identified with the naked eye since the color changes when heated.

ULTRA-HIGH DIELECTRIC CONSTANT GARNET
20190389773 · 2019-12-26 ·

Disclosed are embodiments of synthetic garnet materials for use in radiofrequency applications. In some embodiments, increased amounts of bismuth can be added into specific sites in the crystal structure of the synthetic garnet in order to boost certain properties, such as the dielectric constant and magnetization. Accordingly, embodiments of the disclosed materials can be used in high frequency applications, such as in base station antennas.

ULTRA-HIGH DIELECTRIC CONSTANT GARNET
20190389773 · 2019-12-26 ·

Disclosed are embodiments of synthetic garnet materials for use in radiofrequency applications. In some embodiments, increased amounts of bismuth can be added into specific sites in the crystal structure of the synthetic garnet in order to boost certain properties, such as the dielectric constant and magnetization. Accordingly, embodiments of the disclosed materials can be used in high frequency applications, such as in base station antennas.

LASER ASSISTED FLASH SINTERING

Disclosed is a method of flash sintering a sample composed of ceramic particles by providing laser energy to change the electrical properties of the ceramic material. The processes and systems disclosed herein do not require large heating equipment like a furnace allowing for a portable system of repairing ceramic materials in the field.