Patent classifications
C
C07
C07C
11/00
C07C11/22
C07C11/22
Methods of using high-purity alkynes for selective deposition
12503760
·
2025-12-23
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Methods of using high-purity alkynes substantially free of residual alkyl halides, water and/or carboxylic acids and their use (e.g., in formulations) for enhanced passivation of metallic substrates.