The present disclosure provides a process for producing trifluoroiodomethane, the process comprising providing a reactant stream comprising hydrogen iodide and at least one trifluoroacetyl halide selected from the group consisting of trifluoroacetyl chloride, trifluoroacetyl fluoride, trifluoroacetyl bromide, and combinations thereof, reacting the reactant stream in the presence of a first catalyst at a first reaction temperature from about 25° C. to about 400° C. to produce an intermediate product stream comprising trifluoroacetyl iodide, and reacting the intermediate product stream in the presence of a second catalyst at a second reaction temperature from about 200° C. to about 600° C. to produce a final product stream comprising the trifluoroiodomethane.

The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound, in particular, a simple method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound (I) containing at least one —CF.sub.2— moiety, the method comprising step A of allowing IF.sub.5 and a disulfide compound (III) of the formula: R.sup.A—S—S—R.sup.A (wherein R.sup.A, in each occurrence, independently represents aryl optionally having at least one substituent or alkyl optionally having at least one substituent) to act on a carbonyl compound (II) containing at least one —C(O)— moiety.

The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound, in particular, a simple method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound (I) containing at least one —CF.sub.2— moiety, the method comprising step A of allowing IF.sub.5 and a disulfide compound (III) of the formula: R.sup.A—S—S—R.sup.A (wherein R.sup.A, in each occurrence, independently represents aryl optionally having at least one substituent or alkyl optionally having at least one substituent) to act on a carbonyl compound (II) containing at least one —C(O)— moiety.

A method of producing trifluoroiodomethane (CF.sub.3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI), passing the feedstock through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI.sub.3) and iodine (I.sub.2) from the feedstock, and providing the feedstock to a reactor to produce a trifluoroiodomethane product stream. Another method of producing trifluoroiodomethane (CF3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI) to a reactor to produce a trifluoroiodomethane product stream, and passing the trifluoroiodomethane product stream from the reactor through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI3) and iodine (I2) from the trifluoroiodomethane product stream.

A method of producing trifluoroiodomethane (CF.sub.3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI), passing the feedstock through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI.sub.3) and iodine (I.sub.2) from the feedstock, and providing the feedstock to a reactor to produce a trifluoroiodomethane product stream. Another method of producing trifluoroiodomethane (CF3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI) to a reactor to produce a trifluoroiodomethane product stream, and passing the trifluoroiodomethane product stream from the reactor through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI3) and iodine (I2) from the trifluoroiodomethane product stream.

A dry etching method according to one embodiment of the present disclosure includes plasmatizing a dry etching agent and etching a silicon oxide or a silicon nitride with the plasmatized dry etching agent, wherein the dry etching agent comprises CF.sub.3I and a C2-C3 fluorine-containing linear nitrile compound, and wherein the concentration of the C2-C3 fluorine-containing linear nitrile compound relative to the CF.sub.3I is higher than or equal to 1 vol. ppm and lower than or equal to 1 vol %.

A method of producing trifluoroiodomethane (CF.sub.3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI), passing the feedstock through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI.sub.3) and iodine (I.sub.2) from the feedstock, and providing the feedstock to a reactor to produce a trifluoroiodomethane product stream.

Another method of producing trifluoroiodomethane (CF3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI) to a reactor to produce a trifluoroiodomethane product stream, and passing the trifluoroiodomethane product stream from the reactor through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI3) and iodine (I2) from the trifluoroiodomethane product stream.

A method of producing trifluoroiodomethane (CF.sub.3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI), passing the feedstock through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI.sub.3) and iodine (I.sub.2) from the feedstock, and providing the feedstock to a reactor to produce a trifluoroiodomethane product stream.

Another method of producing trifluoroiodomethane (CF3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI) to a reactor to produce a trifluoroiodomethane product stream, and passing the trifluoroiodomethane product stream from the reactor through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI3) and iodine (I2) from the trifluoroiodomethane product stream.

Fluorine gas is introduced to a raw material liquid containing a reaction inducer and a fluorinated hydrocarbon represented by C.sub.pH.sub.qCl.sub.rF.sub.s (in the formula, p is an integer of 3 to 18, q is an integer of 0 to 3, r is an integer of 0 to 9, and s is an integer of 5 to 30) and having no carbon-carbon unsaturated bond to give tetrafluoromethane. The reaction inducer is a halogen-containing carbon compound liquid at room temperature and pressure and is reacted with fluorine gas to induce a reaction of forming tetrafluoromethane from the fluorinated hydrocarbon and the fluorine gas. The reaction inducer is contained at a content of more than 0% by mass and not more than 10% by mass when the total content of the fluorinated hydrocarbon and the reaction inducer contained in the raw material liquid is 100% by mass.

Fluorine gas is introduced to a raw material liquid containing a reaction inducer and a fluorinated hydrocarbon represented by C.sub.pH.sub.qCl.sub.rF.sub.s (in the formula, p is an integer of 3 to 18, q is an integer of 0 to 3, r is an integer of 0 to 9, and s is an integer of 5 to 30) and having no carbon-carbon unsaturated bond to give tetrafluoromethane. The reaction inducer is a halogen-containing carbon compound liquid at room temperature and pressure and is reacted with fluorine gas to induce a reaction of forming tetrafluoromethane from the fluorinated hydrocarbon and the fluorine gas. The reaction inducer is contained at a content of more than 0% by mass and not more than 10% by mass when the total content of the fluorinated hydrocarbon and the reaction inducer contained in the raw material liquid is 100% by mass.