Disclosed is a process for preparing a highly pure 1,1,1,2,3-pentachloropropane product, comprising 1-a) providing a reaction mixture comprising ethylene, carbon tetrachloride and a catalyst in a principal alkylation zone to produce 1,1,1,3-tetrachloropropane in the reaction mixture, and 1-btreating the reaction mixture obtained in step 1-a) to obtain a 1,1,1,3-tetrachloropropane feedstock; 2-a) contacting the 1,1,1,3-tetrachloropropane feedstock with a catalyst in a dehydrochlorination zone to produce a reaction mixture comprising 1,1,1,3-tetrachloropropane and 1,1,3-trichloropropene, and 2-b) treating the reaction mixture obtained in step 2-a) to obtain a 1,1,3-trichloropropene feedstock; 3-a) contacting the 1,1,3-trichloropropene feedstock with chlorine in a reaction zone to produce a reaction mixture containing 1,1,1,2,3-pentachloropropane and 1,1,3-trichloropropene, the reaction zone being different from the dehydrochlorination zone, and 3-b) treating the reaction mixture obtained in step 3-a) to obtain the highly pure 1,1,1,2,3-pentachloropropane product.

Provided is a method for easily and safely removing, from a reactor, a catalyst used in a reaction that is performed using hydrogen fluoride in the presence of the catalyst. In a reaction performed in a reactor containing at least hydrogen fluoride and a catalyst, the catalyst is removed through a process comprising a heating step of performing heat-treatment so that the ambient temperature of the reactor is 80° C. or more after completion of the reaction, and a purge step of flowing inert gas into the reactor to discharge the hydrogen fluoride to the outside of the reactor after completion of the reaction.

Provided is a method for easily and safely removing, from a reactor, a catalyst used in a reaction that is performed using hydrogen fluoride in the presence of the catalyst. In a reaction performed in a reactor containing at least hydrogen fluoride and a catalyst, the catalyst is removed through a process comprising a heating step of performing heat-treatment so that the ambient temperature of the reactor is 80° C. or more after completion of the reaction, and a purge step of flowing inert gas into the reactor to discharge the hydrogen fluoride to the outside of the reactor after completion of the reaction.

A production process for the production of E-1-chloro-3,3,3-trifluoropropene, the process including at least one stage during which 1,3,3,3-tetrachloropropene reacts with anhydrous hydrofluoric acid in the liquid phase, in the absence of a catalyst, with an HF/1,1,3,3-tetrachloropropene molar ratio between 3 and 20 inclusive, at a temperature between 50° C. and 150° C. inclusive and an absolute pressure of between 1 and 20 bar inclusive.

A production process for the production of E-1-chloro-3,3,3-trifluoropropene, the process including at least one stage during which 1,3,3,3-tetrachloropropene reacts with anhydrous hydrofluoric acid in the liquid phase, in the absence of a catalyst, with an HF/1,1,3,3-tetrachloropropene molar ratio between 3 and 20 inclusive, at a temperature between 50° C. and 150° C. inclusive and an absolute pressure of between 1 and 20 bar inclusive.

The present invention provides a process for the preparation of 1-chloro-2,2-difluoroethane comprising the following stages: (i) dehydrofluorinating 1,1,1-trifluoro-2-chloroethane to form a product stream comprising 1-chloro-2,2-difluoroethylene, optionally separation of 1-chloro-2,2-difluoroethylene from the product stream and (ii) hydrogenating 1-chloro-2,2-difluoroethylene obtained in stage (i) to give 1-chloro-2,2-difluoroethane.

The present invention provides a process for the preparation of 1-chloro-2,2-difluoroethane comprising the following stages: (i) dehydrofluorinating 1,1,1-trifluoro-2-chloroethane to form a product stream comprising 1-chloro-2,2-difluoroethylene, optionally separation of 1-chloro-2,2-difluoroethylene from the product stream and (ii) hydrogenating 1-chloro-2,2-difluoroethylene obtained in stage (i) to give 1-chloro-2,2-difluoroethane.

The invention relates to a process for the preparation of compound of formula (I) wherein R.sub.1 is halogen and R.sub.2 is halogen or hydrogen; comprising a) reacting the compound of formula (II) in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent, to the compound of formula I wherein R.sub.1 is halogen and R.sub.2 is hydrogen, and b) reacting the compound of formula (I), wherein R.sub.1 is chloro and R.sub.2 is hydrogen, in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent to a compound of formula I, wherein R.sub.1 is chloro and R.sub.2 is halogen.

##STR00001##

The invention relates to a process for the preparation of compound of formula (I) wherein R.sub.1 is halogen and R.sub.2 is halogen or hydrogen; comprising a) reacting the compound of formula (II) in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent, to the compound of formula I wherein R.sub.1 is halogen and R.sub.2 is hydrogen, and b) reacting the compound of formula (I), wherein R.sub.1 is chloro and R.sub.2 is hydrogen, in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent to a compound of formula I, wherein R.sub.1 is chloro and R.sub.2 is halogen.

##STR00001##

The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.