Patent classifications
C07C19/08
DEVICE, METHODS AND USES FOR TREATING ANAPHYLAXIS
The present disclosure provides a metered dose inhaler (MDI) comprising an API formulation suitable for administration to a patient in need thereof by inhalation, as well as methods and uses of the MDI.
DEVICE, METHODS AND USES FOR TREATING ANAPHYLAXIS
The present disclosure provides a metered dose inhaler (MDI) comprising an API formulation suitable for administration to a patient in need thereof by inhalation, as well as methods and uses of the MDI.
HYDROFLUORINATION OF 1233XF TO 244BB BY SBF5
A method hydrofluorinates an olefin of the formula: RCX=CYZ to produce a hydrofluoroalkane of formula RCXFCHYZ or RCXHCFYZ, where X, Y, and Z are independently the same or different and are selected from the group consisting of H, F, Cl, Br, and C.sub.1-C.sub.6 alkyl which is partially or fully substituted with chloro or fluoro or bromo; and R is a C.sub.1-C.sub.6 alkyl which is unsubstituted or substituted with chloro or fluoro or bromo. The method includes reacting the olefin with HF in the vapor phase, in the presence of SbF.sub.5, at a temperature ranging from about −30° C. to about 65° C. and compositions formed by the process.
HYDROFLUORINATION OF 1233XF TO 244BB BY SBF5
A method hydrofluorinates an olefin of the formula: RCX=CYZ to produce a hydrofluoroalkane of formula RCXFCHYZ or RCXHCFYZ, where X, Y, and Z are independently the same or different and are selected from the group consisting of H, F, Cl, Br, and C.sub.1-C.sub.6 alkyl which is partially or fully substituted with chloro or fluoro or bromo; and R is a C.sub.1-C.sub.6 alkyl which is unsubstituted or substituted with chloro or fluoro or bromo. The method includes reacting the olefin with HF in the vapor phase, in the presence of SbF.sub.5, at a temperature ranging from about −30° C. to about 65° C. and compositions formed by the process.
HYDROFLUORINATION OF 1233XF TO 244BB BY SBF5
A method hydrofluorinates an olefin of the formula: RCX=CYZ to produce a hydrofluoroalkane of formula RCXFCHYZ or RCXHCFYZ, where X, Y, and Z are independently the same or different and are selected from the group consisting of H, F, Cl, Br, and C.sub.1-C.sub.6 alkyl which is partially or fully substituted with chloro or fluoro or bromo; and R is a C.sub.1-C.sub.6 alkyl which is unsubstituted or substituted with chloro or fluoro or bromo. The method includes reacting the olefin with HF in the vapor phase, in the presence of SbF.sub.5, at a temperature ranging from about −30° C. to about 65° C. and compositions formed by the process.
Method for producing reaction gas containing (E)-1,2-difluoroethylene
The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
Method for producing reaction gas containing (E)-1,2-difluoroethylene
The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
METHOD FOR PURIFYING FLUORINATED HYDROCARBON COMPOUND
The present invention is a method for purifying a fluorohydrocarbon compound comprising bringing a crude saturated fluorohydrocarbon compound having 4 or 5 carbon atoms into contact with a salt-type strongly acidic ion-exchange resin to remove water from the crude saturated fluorohydrocarbon compound. The present invention provides a method for purifying a fluorohydrocarbon compound that can sufficiently remove water from the fluorohydrocarbon compound without causing a decrease in the purity of the fluorohydrocarbon compound due to decomposition.
METHOD FOR PURIFYING FLUORINATED HYDROCARBON COMPOUND
The present invention is a method for purifying a fluorohydrocarbon compound comprising bringing a crude saturated fluorohydrocarbon compound having 4 or 5 carbon atoms into contact with a salt-type strongly acidic ion-exchange resin to remove water from the crude saturated fluorohydrocarbon compound. The present invention provides a method for purifying a fluorohydrocarbon compound that can sufficiently remove water from the fluorohydrocarbon compound without causing a decrease in the purity of the fluorohydrocarbon compound due to decomposition.
CHEMISTRIES FOR ETCHING MULTI-STACKED LAYERS
Methods for fabricating a 3D NAND flash memory are disclosed. The method includes the steps of forming a hardmask pattern on the hardmask layer, and using the hardmask pattern to form apertures in the alternating layers by selectively plasma etching the alternating layers versus the hardmask layer using a hydrofluorocarbon etching gas selected from the group consisting of 1,1,1,3,3,3-hexafluoropropane (C.sub.3H.sub.2F.sub.6), 1,1,2,2,3,3-hexafluoropropane (iso-C.sub.3H.sub.2F.sub.6), 1,1,1,2,3,3,3-heptafluoropropane (C.sub.3HF.sub.7), and 1,1,1,2,2,3,3-heptafluoropropane (iso-C.sub.3HF.sub.7), wherein the first etching layer comprises a material different from that of the second etching layer.