Patent classifications
C07C19/08
CLEANING SOLVENT COMPOSITIONS EXHIBITING AZEOTROPE-LIKE BEHAVIOR AND THEIR USE
An azeotropic cleaning solvent composition has from about 96 to about 98 weight percent 1,1,1,3,3,3-hexafluoro-2-methoxypropane (“HFMOP”) and from about 2 to about 4 weight percent acetone, for example, about 97 weight percent HFMOP and about 3 weight percent acetone. Another composition of the invention has a weight ratio of HFMOP to acetone of about 24 to about 99, for example, about 24 to 49. Conventional additives such as surfactants, lubricants and co-solvents may be present in an amount not to exceed about 10 weight percent of the composition. A method of the invention comprises contacting an article of manufacture with the solvent composition in order to clean the article of manufacture and then removing the solvent composition from the article of manufacture.
CLEANING SOLVENT COMPOSITIONS EXHIBITING AZEOTROPE-LIKE BEHAVIOR AND THEIR USE
An azeotropic cleaning solvent composition has from about 96 to about 98 weight percent 1,1,1,3,3,3-hexafluoro-2-methoxypropane (“HFMOP”) and from about 2 to about 4 weight percent acetone, for example, about 97 weight percent HFMOP and about 3 weight percent acetone. Another composition of the invention has a weight ratio of HFMOP to acetone of about 24 to about 99, for example, about 24 to 49. Conventional additives such as surfactants, lubricants and co-solvents may be present in an amount not to exceed about 10 weight percent of the composition. A method of the invention comprises contacting an article of manufacture with the solvent composition in order to clean the article of manufacture and then removing the solvent composition from the article of manufacture.
AZEOTROPIC COMPOSITIONS OF HYDROGEN FLUORIDE AND Z-3,3,3-TRIFLUORO-1-CHLOROPROPENE
An azeotropic or quasi-azeotropic composition including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more (hydro)halocarbon compounds including 1 to 3 carbon atoms. The (hydro) halocarbon compounds are preferably selected among tetrachlorofluoropropanes, trichlorodifluoropropanes, dichlorotrifluoropropanes, chlorotetrafluoropropanes, pentafluoropropanes, dichlorodifluoropropenes, chlorotrifluoropropenes and tetrafluoropropenes. A process for producing a main (hydro)halocarbon compound, including the formation of a mixture of compounds including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more other (hydro)halocarbon compounds, distillation of this mixture making it possible to collect, firstly, an azeotropic composition, and, secondly, at least one of the compounds of the mixture.
AZEOTROPIC COMPOSITIONS OF HYDROGEN FLUORIDE AND Z-3,3,3-TRIFLUORO-1-CHLOROPROPENE
An azeotropic or quasi-azeotropic composition including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more (hydro)halocarbon compounds including 1 to 3 carbon atoms. The (hydro) halocarbon compounds are preferably selected among tetrachlorofluoropropanes, trichlorodifluoropropanes, dichlorotrifluoropropanes, chlorotetrafluoropropanes, pentafluoropropanes, dichlorodifluoropropenes, chlorotrifluoropropenes and tetrafluoropropenes. A process for producing a main (hydro)halocarbon compound, including the formation of a mixture of compounds including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more other (hydro)halocarbon compounds, distillation of this mixture making it possible to collect, firstly, an azeotropic composition, and, secondly, at least one of the compounds of the mixture.
High-purity 1,1,1,2,3,3-hexafluoropropane, method for producing same and use thereof
The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.
High-purity 1,1,1,2,3,3-hexafluoropropane, method for producing same and use thereof
The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.
High-purity 1,1,1,2,3,3-hexafluoropropane, method for producing same and use thereof
The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.
HIGH PURITY HFO-E-1,3,3,3-TETRAFLUOROPROPENE (trans-HFO-1234ze) AND METHODS FOR PRODUCING SAME
The present disclosure provides high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze). More specifically, the present disclosure provides E-1,3,3,3-tetrafluoropropene (HFO-234ze) in at least 99.99% purity, containing less than 3 ppm 1,1,3,3,3-pentafluoropropene (HFO-1225zc). The present disclosure further provides a method of making high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze).
HIGH PURITY HFO-E-1,3,3,3-TETRAFLUOROPROPENE (trans-HFO-1234ze) AND METHODS FOR PRODUCING SAME
The present disclosure provides high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze). More specifically, the present disclosure provides E-1,3,3,3-tetrafluoropropene (HFO-234ze) in at least 99.99% purity, containing less than 3 ppm 1,1,3,3,3-pentafluoropropene (HFO-1225zc). The present disclosure further provides a method of making high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze).
Non-flammable electrolyte containing liquefied gas and lithium secondary batteries containing same
A rechargeable lithium cell comprising a cathode, an anode, an optional ion-permeable membrane disposed between the anode and the cathode, a non-flammable salt-retained liquefied gas electrolyte in contact with the cathode and the anode, wherein the electrolyte contains a lithium salt dissolved in or mixed with a liquefied gas solvent having a lithium salt concentration greater than 1.0 M so that the electrolyte exhibits a vapor pressure less than 1 kPa when measured at 20° C., a vapor pressure less than 60% of the vapor pressure of the liquefied gas solvent alone, a flash point at least 20 degrees Celsius higher than a flash point of the liquefied gas solvent alone, a flash point higher than 150° C., or no flash point, wherein the liquefied gas solvent is selected from methane, fluoromethane, difluoromethane, chloromethane, dichloromethane, ethane, fluoroethane, difluoroethane, tetrafluoroethane, chloroethane, dichloroethane, tetrachloroethane, propane, fluoropropane, chloropropane, ethylene, fluoroethylene, chloroethylene, or a combination thereof.