The present disclosure relates to an ionic compound including an anion group of Chemical Formula 1, and a coating composition and an organic light emitting device including the same.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

A process that allows halogenation at the alpha-H position of alkylarenes, optionally further substituted on the aromatic or heteroaromatic ring, is described.

A process that allows halogenation at the alpha-H position of alkylarenes, optionally further substituted on the aromatic or heteroaromatic ring, is described.

Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator:

##STR00001##

wherein, in formula (I), R.sup.1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other.

Catalytic methods for synthesis of super linear alkenyl arenes and alkyl arenes are provided. The methods are capable of synthesizing super linear alkyl and alkenyl arenes from simple arene and olefin starting materials and with high selectivity for linear coupling. Methods are also provided for making a 2,6-dimethylnapthalene (DMN) or 2,6-methylethylnapthalene (MEN).

Catalytic methods for synthesis of super linear alkenyl arenes and alkyl arenes are provided. The methods are capable of synthesizing super linear alkyl and alkenyl arenes from simple arene and olefin starting materials and with high selectivity for linear coupling. Methods are also provided for making a 2,6-dimethylnapthalene (DMN) or 2,6-methylethylnapthalene (MEN).

The present invention provides a halo-de-carboxylation process for the preparation of organic chlorides, organic bromides and mixtures thereof, from their corresponding carboxylic acids, using a chlorinating agent selected from trichloroisocyanuric acid (TCCA), dichloroisocyanuric acid (DCCA), or combination thereof, and a brominating agent.

The present invention provides a halo-de-carboxylation process for the preparation of organic chlorides, organic bromides and mixtures thereof, from their corresponding carboxylic acids, using a chlorinating agent selected from trichloroisocyanuric acid (TCCA), dichloroisocyanuric acid (DCCA), or combination thereof, and a brominating agent.