Patent classifications
C07C25/02
ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE
A substituted alkenylbenzene compound of formula (4):
##STR00001##
wherein X.sup.1 is selected from the group consisting of a halogen atom, SF.sub.5, C.sub.1-C.sub.6haloalkyl, hydroxy C.sub.1-C.sub.6haloalkyl, C.sub.1-C.sub.6alkoxy C.sub.1-C.sub.6haloalkyl, C.sub.3-C.sub.8halocycloalkyl, C.sub.1-C.sub.6haloalkoxy, C.sub.1-C.sub.3haloalkoxy C.sub.1-C.sub.3haloalkoxy, C.sub.1-C.sub.6haloalkylthio, C.sub.1-C.sub.6haloalkylsulfinyl and C.sub.1-C.sub.6haloalkylsulfonyl; X.sup.3 is selected from the group consisting of a hydrogen atom, halogen atom, cyano, nitro, C.sub.1-C.sub.6alkyl, C.sub.1-C.sub.6haloalkyl, C.sub.1-C.sub.6alkoxy and C.sub.1-C.sub.6alkylthio; X.sup.4 is selected from the group consisting of a hydrogen atom, halogen atom, cyano, C.sub.1-C.sub.4alkyl, C.sub.1-C.sub.4alkoxy and C.sub.1-C.sub.4haloalkoxy; R.sup.3 is C(R.sup.3a)(R.sup.3b)R.sup.3c, where R.sup.3a and R.sup.3b independently of each other are a halogen atom, or R.sup.3a and R.sup.3b together form 3- to 6-membered ring together with the carbon atom bonding them by forming a C.sub.2-C.sub.5haloalkylene chain, and R.sup.3c is selected from the group consisting of a hydrogen atom, halogen atom, C.sub.1-C.sub.5alkyl, C.sub.1-C.sub.5haloalkyl, C.sub.1-C.sub.4haloalkoxy and C.sub.1-C.sub.4haloalkylthio, with a proviso that in case where X.sup.1 is a fluorine atom, chlorine atom or trifluoromethyl, and both X.sup.2 and X.sup.3 are a hydrogen atom, in case where both X.sup.1 and X.sup.2 are fluorine atom and X.sup.3 is a hydrogen atom, and in case where both X.sup.1 and X.sup.2 are trifluoromethyl and X.sup.3 is a hydrogen atom, R.sup.3c is a hydrogen atom, chlorine atom, bromine atom, iodine atom, C.sub.1-C.sub.5alkyl, C.sub.1-C.sub.5haloalkyl, C.sub.1-C.sub.4haloalkoxy or C.sub.1-C.sub.4haloalkylthio.
NOVEL POTASSIUM CHANNEL INHIBITORS
The present invention relates to novel compounds, pharmaceutical compositions comprising such compounds and their use for treating, alleviating or preventing diseases or disorders relating to the activity of potassium channels.
##STR00001##
NOVEL POTASSIUM CHANNEL INHIBITORS
The present invention relates to novel compounds, pharmaceutical compositions comprising such compounds and their use for treating, alleviating or preventing diseases or disorders relating to the activity of potassium channels.
##STR00001##
METHOD FOR CHLORINATING AROMATIC COMPOUND
The present invention relates to a method for chlorinating an aromatic compound and, more specifically, to a method for chlorinating an aromatic compound to prevent the phenomenon of decreased responsiveness due to foam generation, and to prevent counterflow of a fluid.
By means of the method for chlorinating an aromatic compound according to the present invention, a plurality of column-type reactors are connected in series so that reaction products produced in a former reactor are inserted to a latter reactor, and chlorine gas is inserted in equal measure at the bottom of each reactor. Accordingly, a chlorination reaction occurs in each of the reactors, and hydrogen chloride gas generated in each of the reactors is exhausted from each of the reactors.
METHOD FOR CHLORINATING AROMATIC COMPOUND
The present invention relates to a method for chlorinating an aromatic compound and, more specifically, to a method for chlorinating an aromatic compound to prevent the phenomenon of decreased responsiveness due to foam generation, and to prevent counterflow of a fluid.
By means of the method for chlorinating an aromatic compound according to the present invention, a plurality of column-type reactors are connected in series so that reaction products produced in a former reactor are inserted to a latter reactor, and chlorine gas is inserted in equal measure at the bottom of each reactor. Accordingly, a chlorination reaction occurs in each of the reactors, and hydrogen chloride gas generated in each of the reactors is exhausted from each of the reactors.
METHOD FOR CHLORINATING AROMATIC COMPOUND
The present invention relates to a method for chlorinating an aromatic compound and, more specifically, to a method for chlorinating an aromatic compound to prevent the phenomenon of decreased responsiveness due to foam generation, and to prevent counterflow of a fluid.
By means of the method for chlorinating an aromatic compound according to the present invention, a plurality of column-type reactors are connected in series so that reaction products produced in a former reactor are inserted to a latter reactor, and chlorine gas is inserted in equal measure at the bottom of each reactor. Accordingly, a chlorination reaction occurs in each of the reactors, and hydrogen chloride gas generated in each of the reactors is exhausted from each of the reactors.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by general formula (S1) and an acid decomposable resin. In the general formula (S1), Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, and Q.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, or Q.sup.5 represents a substituent including an aryloxy group represented by general formula (QR1), Lq.sup.1 represents a single bond or a divalent linking group; and M.sup.+ represents an organic cation. In the general formula (QR1), G.sup.1, G.sup.2, G.sup.3, G.sup.4, and G.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of G.sup.1, G.sup.2, G.sup.3, G.sup.4, or G.sup.5 represents a substituent including an ester group; and * represents a bonding position.
##STR00001##
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by general formula (S1) and an acid decomposable resin. In the general formula (S1), Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, and Q.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, or Q.sup.5 represents a substituent including an aryloxy group represented by general formula (QR1), Lq.sup.1 represents a single bond or a divalent linking group; and M.sup.+ represents an organic cation. In the general formula (QR1), G.sup.1, G.sup.2, G.sup.3, G.sup.4, and G.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of G.sup.1, G.sup.2, G.sup.3, G.sup.4, or G.sup.5 represents a substituent including an ester group; and * represents a bonding position.
##STR00001##
Organic Cocrystal and Applications of the Same
The present disclosure relates inter alia to an organic cocrystal comprising at least three compounds A, B and C, and the method to prepare the said organic cocrystal, and organic electronic devices comprising the said organic cocrystal, and their application and use.
ORGANIC METAL COMPLEX, AND ORGANIC LIGHT EMITTING DEVICE AND DISPLAY APPARATUS USING THE SAME
Provided is an organic metal complex having a structure represented by the following general formula (1):
ML.sub.mL.sub.n(1)
where: M represents a metal atom selected from Ir, Pt, Rh, Os, and Zn; L and L, which are different from each other, each represent a bidentate ligand; m represents an integer of 1 to 3 and n represents an integer of 0 to 2, provided that m+n is 3; a partial structure ML.sub.m represents a structure represented by the following general formula (2):
##STR00001##
and a partial structure ML.sub.n represents a structure including a monovalent bidentate ligand.