A resin having a small linear thermal expansion coefficient and a low absorbance is provided. The resin is characterized by including at least one structure selected from structures represented by the following general formulae (1) and (2): ##STR00001##

The present invention relates to a novel method for producing fluorinated cycloaliphatic compounds from the analogous aromatic compounds by hydrogenation with an Rh-carbene catalyst system.

The present invention relates to a novel method for producing fluorinated cycloaliphatic compounds from the analogous aromatic compounds by hydrogenation with an Rh-carbene catalyst system.

A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone. ##STR00001##

A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone. ##STR00001##

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.1 and X.sup.2 each represent *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; A.sup.1 represents a group having a lactone structure which may have a substituent; L.sup.2 and L.sup.3 each represent a single bond or an alkanediyl group; R.sup.1 represents an iodine atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.1 and X.sup.2 each represent *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; A.sup.1 represents a group having a lactone structure which may have a substituent; L.sup.2 and L.sup.3 each represent a single bond or an alkanediyl group; R.sup.1 represents an iodine atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity. ##STR00001##

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity. ##STR00001##

Embodiments in accordance with the present invention encompass compositions comprising a soluble photoacid generator, a organopalladium compound, a photosensitizer and one or more olefinic monomers which undergo vinyl addition polymerization when said composition is exposed to a suitable actinic radiation to form a substantially transparent film. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films having various opto-electronic properties. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, among others.