The invention relates to a compound of formula I,

##STR00001##

R.sup.11, R.sup.21, A.sup.11, A, Z, X.sup.11, X.sup.21, Y.sup.11, Y.sup.12, Sp.sup.11, Sp.sup.21, o and p have one of the meanings as given in claim 1. The invention further relates to method of production of a compound of formula I, to the use of said compounds in LC media and to LC media comprising one or more compounds of formula I. Further, the invention relates to a method of production of such LC media, to the use of such media in LC devices, and to LC device comprising a LC medium according to the present invention. The present invention further relates to a process for the fabrication such liquid crystal display and to the use of the liquid crystal mixtures according to the invention for the fabrication of such liquid crystal display.

The invention relates to a new process for the manufacture or synthesis, respectively, of fluorinated benzenes and fluorinated benzophenones, and derivatives thereof, in particular of fluorobenzenes and derivatives thereof. The present invention particularly pertains to a novel environmentally friendly process for the synthesis of fluorinated benzenes and benzophenones as raw materials for the manufacture of polyaryletherketones (PAEKs).

The invention relates to a new process for the manufacture or synthesis, respectively, of fluorinated benzenes and fluorinated benzophenones, and derivatives thereof, in particular of fluorobenzenes and derivatives thereof. The present invention particularly pertains to a novel environmentally friendly process for the synthesis of fluorinated benzenes and benzophenones as raw materials for the manufacture of polyaryletherketones (PAEKs).

A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

##STR00001##

A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

##STR00001##

A smectic A composition with the positive dielectric anisotropy exhibiting a monolayer smectic A structure (SmA.sub.1), which shows a phase transition from a smectic A phase to an isotropic phase (SmA-Iso) or a phase transition from a smectic A phase through a nematic phase to an isotropic phase (SmA-N-Iso) and includes at least two fluorinated compounds selected from the families of fluorinated derivatives of biphenyls and terphenyls expressed by the general formulae 1-12.

For ensuring of the high level of the conductivity the composition is doped with the ionic amidynium salts and/or the ionic potassium complexes of the crown ethers wherein the charge on the cation is delocalized. Such a structure of the ionic compound ensures the better solubility in the liquid crystalline fluorinated composition in comparison to that observed for quaternary ammonium salts.

For writing of the information the dynamic scattering effect (DS) was used, where the transition from a opaque (milky) state to a clear (transparent) state or reversal process is obtained by the change of the frequency of a driving alternating electric field.

The modification of the properties of the smectic A composition by adding of further components such as fluorinated four ring liquid crystal compounds or pyrimidine compounds or cyanocompounds is described.

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

##STR00001##

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

##STR00001##

Methods of preparing fluorinated compounds by carboxylative fluorination using fluoride are contained herein. Fluorinated compounds are provided. Methods of using fluorinated compounds are contained herein.

Methods of preparing fluorinated compounds by carboxylative fluorination using fluoride are contained herein. Fluorinated compounds are provided. Methods of using fluorinated compounds are contained herein.