C07C31/13

Radiation-sensitive resin composition, method for forming resist pattern and compound

A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R.sup.1 and R.sup.2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R.sup.1 and R.sup.2 are bonded; R.sup.3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at ?-, ?- and ?-positions of the carbon atom to which R.sup.1 and R.sup.2 are bonded; and No fluorine atom is bonded to carbon atoms located at ?- and ?-positions of the carbon atom to which R.sup.3 is bonded. ##STR00001##

Radiation-sensitive resin composition, method for forming resist pattern and compound

A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R.sup.1 and R.sup.2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R.sup.1 and R.sup.2 are bonded; R.sup.3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at ?-, ?- and ?-positions of the carbon atom to which R.sup.1 and R.sup.2 are bonded; and No fluorine atom is bonded to carbon atoms located at ?- and ?-positions of the carbon atom to which R.sup.3 is bonded. ##STR00001##

NOVEL AROMA CHEMICALS HAVING A 1,2,2-TRIMETHYLCYCLOPENTAN-1-YL MOIETY

The present invention relates to novel compounds of general formulae (la), (lb) and (Ic) and to the stereoisomers thereof. The compounds are useful as a fragrance or as flavor as they have a sandalwood like scent. The invention also relates to a method for imparting or modifying a scent or a flavor to a composition by including said compounds into such composition, to a fragrance containing composition and/or a fragrance material containing said compound and to a process for preparing these compounds. X is C(R.sup.4)OH or CO; R.sup.1 is selected from the group consisting of hydrogen, C.sub.1-C.sub.4-alkyl, C.sub.2-C.sub.4-alkenyl and C.sub.3-C.sub.4-cycloalkyl, R.sup.2 is selected from the group consisting of hydrogen, C.sub.1-C.sub.4-alkyl, C.sub.2-C.sub.4-alkenyl and C.sub.3-C.sub.4-cycloalkyl, R.sup.3 is C.sub.1-C.sub.4-alkyl, R.sup.3a is selected from the group consisting of hydrogen and C.sub.1-C.sub.4-alkyl, R.sup.3b is hydrogen or together with R.sup.3a is CH.sub.2; R.sup.4 is selected from the group consisting of hydrogen and C.sub.1-C.sub.4-alkyl.

##STR00001##

NOVEL AROMA CHEMICALS HAVING A 1,2,2-TRIMETHYLCYCLOPENTAN-1-YL MOIETY

The present invention relates to novel compounds of general formulae (la), (lb) and (Ic) and to the stereoisomers thereof. The compounds are useful as a fragrance or as flavor as they have a sandalwood like scent. The invention also relates to a method for imparting or modifying a scent or a flavor to a composition by including said compounds into such composition, to a fragrance containing composition and/or a fragrance material containing said compound and to a process for preparing these compounds. X is C(R.sup.4)OH or CO; R.sup.1 is selected from the group consisting of hydrogen, C.sub.1-C.sub.4-alkyl, C.sub.2-C.sub.4-alkenyl and C.sub.3-C.sub.4-cycloalkyl, R.sup.2 is selected from the group consisting of hydrogen, C.sub.1-C.sub.4-alkyl, C.sub.2-C.sub.4-alkenyl and C.sub.3-C.sub.4-cycloalkyl, R.sup.3 is C.sub.1-C.sub.4-alkyl, R.sup.3a is selected from the group consisting of hydrogen and C.sub.1-C.sub.4-alkyl, R.sup.3b is hydrogen or together with R.sup.3a is CH.sub.2; R.sup.4 is selected from the group consisting of hydrogen and C.sub.1-C.sub.4-alkyl.

##STR00001##

CYCLOPROPANATION OF SUBSTITUTED ALKENES
20180170830 · 2018-06-21 ·

Disclosed is a cyclopropanation process comprising the step of reacting an alkene compound having at least one carbon-carbon double bond with at least one dihaloalkane. The reaction is carried out in the presence of (i) particulate metal Zn, (ii) catalytically effective amount of particulate metal Cu or a salt thereof, (iii) at least one haloalkylsilane, and (iv) at least one solvent.

CYCLOPROPANATION OF SUBSTITUTED ALKENES
20180170830 · 2018-06-21 ·

Disclosed is a cyclopropanation process comprising the step of reacting an alkene compound having at least one carbon-carbon double bond with at least one dihaloalkane. The reaction is carried out in the presence of (i) particulate metal Zn, (ii) catalytically effective amount of particulate metal Cu or a salt thereof, (iii) at least one haloalkylsilane, and (iv) at least one solvent.