The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3-dithiodipropionic acid (DPDPA) and N-ethyl-N-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.

The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.

The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.

The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.

The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.

The present invention relates to the field of chemical processes and, more particularly, it concerns valuable new chemical intermediates of formula (IV) for producing perfuming ingredients.

The present invention relates to the field of chemical processes and, more particularly, it concerns valuable new chemical intermediates of formula (IV) for producing perfuming ingredients.

The present invention relates to the field of chemical processes and, more particularly, it concerns valuable new chemical intermediates of formula (IV) for producing perfuming ingredients.

A chemically amplified negative resist composition comprising a polymer comprising repeat units derived from a monomer having a specific hydrating functional group is provided. The chemically amplified negative tone resist composition exhibits a high resolution during pattern formation and forms a pattern having a low LER, pattern fidelity and improved dose margin; and a resist pattern forming process using the resist composition.

A chemically amplified negative resist composition comprising a polymer comprising repeat units derived from a monomer having a specific hydrating functional group is provided. The chemically amplified negative tone resist composition exhibits a high resolution during pattern formation and forms a pattern having a low LER, pattern fidelity and improved dose margin; and a resist pattern forming process using the resist composition.