The present invention relates to novel compounds and their use in the prophylactic and/or therapeutic treatment of fibrosis and fibrosis-related conditions.

The present invention relates to novel compounds and their use in the prophylactic and/or therapeutic treatment of fibrosis and fibrosis-related conditions.

In one aspect, the present disclosure provides methods of preparing a primary or secondary amine and hydroxylated aromatic compounds. In some embodiments, the aromatic compound may be unsubstituted, substituted, or contain one or more heteroatoms within the rings of the aromatic compound. The methods described herein may be carried out without the need for transition metal catalysts or harsh reaction conditions.

In one aspect, the present disclosure provides methods of preparing a primary or secondary amine and hydroxylated aromatic compounds. In some embodiments, the aromatic compound may be unsubstituted, substituted, or contain one or more heteroatoms within the rings of the aromatic compound. The methods described herein may be carried out without the need for transition metal catalysts or harsh reaction conditions.

The present disclosure relates to an effect of promoting hyaluronic acid synthesis of a pomegranate concentrate. A pomegranate concentrate, prepared by treating pomegranate with a starch-degrading enzyme and passing the same through a heating concentration process and having an ellagic acid content of 0.8 mg/g or higher and a polyphenol content of 8 mg/g or higher, has an effect of promoting hyaluronic acid. According to the present disclosure, hyaluronic acid synthesis can be promoted and skin moisturization can be improved by administering a food or pharmaceutical composition containing the pomegranate concentrate as an active ingredient to a subject in need of promotion of hyaluronic acid synthesis.

A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.

A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.

A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.

Disclosed herein are compositions and methods of making phenolic compounds, and resins comprising these phenolic compounds. The compounds include multifunctional epoxies, amino glycidyl derivatives, and multi-functional amines prepared from hydroxymethyl derivatives of phenols and bisphenols. In one embodiment, a compound is of formula I ##STR00001##
wherein R.sub.1 is H or Z; each R.sub.2, R.sub.3, and R.sub.4, independently, are N(Z).sub.2, N(CH.sub.2OZ).sub.2, N(CH.sub.2CH.sub.2OZ).sub.2, N(CH.sub.2OH).sub.2, N(CH.sub.2NH.sub.2).sub.2, OZ, CH.sub.2OZ, CH.sub.2CH.sub.2OZ, CH.sub.2OH, CH.sub.2NH.sub.2, OC(CH.sub.3).sub.3, or O-(alkylene)-CH.sub.3; and Z is ##STR00002##

Disclosed herein are compositions and methods of making phenolic compounds, and resins comprising these phenolic compounds. The compounds include multifunctional epoxies, amino glycidyl derivatives, and multi-functional amines prepared from hydroxymethyl derivatives of phenols and bisphenols. In one embodiment, a compound is of formula I ##STR00001##
wherein R.sub.1 is H or Z; each R.sub.2, R.sub.3, and R.sub.4, independently, are N(Z).sub.2, N(CH.sub.2OZ).sub.2, N(CH.sub.2CH.sub.2OZ).sub.2, N(CH.sub.2OH).sub.2, N(CH.sub.2NH.sub.2).sub.2, OZ, CH.sub.2OZ, CH.sub.2CH.sub.2OZ, CH.sub.2OH, CH.sub.2NH.sub.2, OC(CH.sub.3).sub.3, or O-(alkylene)-CH.sub.3; and Z is ##STR00002##