C07C45/78

Process for the recovery of ketones and glycols from fermentation

Methods may include obtaining ketones and glycols from a fermentation process, the method including: collecting an off-gas and/or a fermented broth from the fermenter, wherein the off-gas comprises a ketone, and wherein the fermented broth comprises one or more of glycol or ketone; and performing at least one of: transferring the off-gas from the fermenter to a ketone recuperation module; or transferring the fermented broth to a fluid separating module; and isolating one or more of: the ketone from the off-gas; and the glycol from the fermented broth.

COATED POROUS POLYMERIC MEMBRANES
20200206691 · 2020-07-02 ·

The present disclosure provides a porous polymeric membrane that is coated with a cross -linked polymerized monomer. The coating on the porous polymeric membrane has a charge when it is immersed in an organic liquid. The coated porous polymeric membrane, a filter utilizing the membrane, and a method for treating an organic liquid used for photoresist with the coated porous polymeric membrane to remove metal contaminants from the organic liquid are disclosed.

CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID

An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.

PROCESS FOR PREPARING METHACROLEIN

Provided is a process for preparing methacrolein which maximizes capture of methanol. Also provided are processes for producing methacrylic acid and methyl methacrylate.

PROCESS FOR PREPARING METHACROLEIN

Provided is a process for preparing methacrolein which maximizes capture of methanol. Also provided are processes for producing methacrylic acid and methyl methacrylate.

SYSTEMS AND METHODS FOR PURIFYING SOLVENTS

The present disclosure is directed to methods of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

SYSTEMS AND METHODS FOR PURIFYING SOLVENTS

The present disclosure is directed to methods of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

PROCESS FOR PREPARING METHACROLEIN

Provided is a process for preparing methacrolein which maximizes capture of methanol. Also provided are processes for producing methacrylic acid and methyl methacrylate.

PROCESS FOR PREPARING METHACROLEIN

Provided is a process for preparing methacrolein which maximizes capture of methanol. Also provided are processes for producing methacrylic acid and methyl methacrylate.

FLUORENYLAMINOKETONE PHOTOINITIATOR, PREPARATION METHOD THEREOF, AND UV PHOTOCURABLE COMPOSITION CONTAINING SAME
20200002544 · 2020-01-02 ·

A fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same. The photoinitiator has a compound having a structure as shown in general formula (I) or a derivative compound thereof. The fluorenylaminoketone photoinitiator may effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and may also have high sensitivity and good deep-layer curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring. A UV photocurable composition containing such a fluorenylaminoketone photoinitiator can have an advantage in terms of high sensitivity, no residue after development, good pattern integrity, no or little odor of coating layers after curing, or excellent yellowing resistance.