A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition including a resin component whose solubility in a developing solution is changed by the action of the acid, and a compound represented by General Formula (d0). In the formula, Ar represents an aromatic ring; I represents an iodine atom; Rd.sup.1 represents a substituent; nd1 represents an integer of 0 or greater as long as a valence permits; nd2 represents an integer of 1 or greater as long as a valence permits; and Z.sup.+ represents an organic cation

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