C07C65/21

SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS

A salt having formula (1) or (2) serving as an acid diffusion inhibitor is provided as well as a resist composition comprising the acid diffusion inhibitor. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography properties such as CDU and LWR.

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Biphenyl Derivatives

The invention relates to a compound of formula (I) wherein R.sup.1—R.sup.3 are as defined in the description and in the claims. The compound of formula (I) can be used as a medicament.

##STR00001##

Biphenyl Derivatives

The invention relates to a compound of formula (I) wherein R.sup.1—R.sup.3 are as defined in the description and in the claims. The compound of formula (I) can be used as a medicament.

##STR00001##

Branched fluorine-containing compound

A novel branched fluorine-containing compound represented by formula (1): ##STR00001##
wherein L represents a predetermined carbon-containing linker moiety; Rf, in each occurrence, is the same or different and represents fluoroalkyl optionally having at least one ether bond; Y, in each occurrence, is the same or different and represents a predetermined divalent linking group or a bond; R.sup.Y, in each occurrence, is the same or different and represents hydrogen or an organic group; L represents an (n1+n2)-valent carbon-containing linker moiety having at least one carbon atom; n1 represents a number greater than or equal to 1; n2 represents a number greater than or equal to 1; n1+n2 is a number from 3 to 6; X, in each occurrence, is the same or different and represents a divalent linking group or a bond; A, in each occurrence, is the same or different and represents -ArSO.sub.3M or the like; M, in each occurrence, is the same or different and represents hydrogen, —NR.sub.4, or a metal salt; and R represents hydrogen or a C.sub.1-4 organic group.

Branched fluorine-containing compound

A novel branched fluorine-containing compound represented by formula (1): ##STR00001##
wherein L represents a predetermined carbon-containing linker moiety; Rf, in each occurrence, is the same or different and represents fluoroalkyl optionally having at least one ether bond; Y, in each occurrence, is the same or different and represents a predetermined divalent linking group or a bond; R.sup.Y, in each occurrence, is the same or different and represents hydrogen or an organic group; L represents an (n1+n2)-valent carbon-containing linker moiety having at least one carbon atom; n1 represents a number greater than or equal to 1; n2 represents a number greater than or equal to 1; n1+n2 is a number from 3 to 6; X, in each occurrence, is the same or different and represents a divalent linking group or a bond; A, in each occurrence, is the same or different and represents -ArSO.sub.3M or the like; M, in each occurrence, is the same or different and represents hydrogen, —NR.sub.4, or a metal salt; and R represents hydrogen or a C.sub.1-4 organic group.

Methods to convert lignin to phenolic and carboxylate compounds
09775347 · 2017-10-03 · ·

A method of converting lignin to phenolic compounds and dicarboxylates in high yield is described. The method involves the use of peroxy acids to react with lignin at a moderated treatment conditions. The peroxy acids can be used along or in combination of other catalysts that have the capability to lower the molecular weight of lignin. A phenolic compounds yield is achieved (>60%) and these phenolic compounds represents high value precursors for various applications include but not limited to antioxidants, health improvement agents, anticorrosive agents, liquid fuel components and performance enhancing agents, resin and adhesives. Dicarboxylic acids can be used for polymer applications or hydrodeoxygenation to hydrocarbon fuel.

Methods to convert lignin to phenolic and carboxylate compounds
09775347 · 2017-10-03 · ·

A method of converting lignin to phenolic compounds and dicarboxylates in high yield is described. The method involves the use of peroxy acids to react with lignin at a moderated treatment conditions. The peroxy acids can be used along or in combination of other catalysts that have the capability to lower the molecular weight of lignin. A phenolic compounds yield is achieved (>60%) and these phenolic compounds represents high value precursors for various applications include but not limited to antioxidants, health improvement agents, anticorrosive agents, liquid fuel components and performance enhancing agents, resin and adhesives. Dicarboxylic acids can be used for polymer applications or hydrodeoxygenation to hydrocarbon fuel.

Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion
11429024 · 2022-08-30 · ·

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##

Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion
11429024 · 2022-08-30 · ·

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##

AROMATIC COMPOUNDS AND PHARMACEUTICAL USES THEREOF

The present disclosure relates to compounds of the general formula (I): wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, and R.sub.7 may be chosen from different substituents; n is 0, 1, or 2; and X is a hydroxymethyl or a carboxylic acid or a derivative thereof, such as a carboxylate, such as a carboxylic ester, a glyceride, an anhydride, a phospholipid, a carboxamide, a phospholipid, or a prodrug thereof; or a pharmaceutically acceptable salt, solvate, solvate of such salt or a prodrug thereof. The present disclosure also relates to pharmaceutical compositions and lipid compositions comprising at least one compound according to the present disclosure, and to such compounds for use as medicaments or for use in therapy, in particular for the treatment of diseases related to metabolic diseases and liver diseases, such as non-alcoholic fatty liver disease and cholestasis diseases.