A sulfonium salt of specific structure has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

A sulfonium salt of specific structure has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

The present invention relates to a composition for preventing or reducing microbial growth, particularly the growth of dermatophytic fungi, and/or aciduric and acidogenic gram-positive bacteria. More particularly, it relates to the use of trans-3,5,4-trihydroxybibenzyl, also known as dihydro-resveratrol, or its dihydrostilbene derivatives and/or chemical variants as an anti-microbial agent. The present invention further relates to the management of dermatophytosis often caused by dermatophytic fungi and the management of dental caries often mediated by aciduric and acidogenic gram-positive Streptococci. The present invention therefore has applications in preventing, alleviating and/or treating dermatophytosis and dental caries.

The present invention relates to a composition for preventing or reducing microbial growth, particularly the growth of dermatophytic fungi, and/or aciduric and acidogenic gram-positive bacteria. More particularly, it relates to the use of trans-3,5,4-trihydroxybibenzyl, also known as dihydro-resveratrol, or its dihydrostilbene derivatives and/or chemical variants as an anti-microbial agent. The present invention further relates to the management of dermatophytosis often caused by dermatophytic fungi and the management of dental caries often mediated by aciduric and acidogenic gram-positive Streptococci. The present invention therefore has applications in preventing, alleviating and/or treating dermatophytosis and dental caries.

The present disclosure discloses prodrugs of gamma-hydroxybutyric acid as well as compositions and uses thereof.

The present disclosure discloses prodrugs of gamma-hydroxybutyric acid as well as compositions and uses thereof.

Some embodiments of the invention include inventive catalysts (e.g., compounds of Formula (I) or (Ia)). Other embodiments include compositions comprising the inventive catalysts. Some embodiments include methods of using the inventive catalysts (e.g., in hydrofluorination of an organic compound). Further embodiments include methods for making the inventive catalysts. Additional embodiments of the invention are also discussed herein.

Some embodiments of the invention include inventive catalysts (e.g., compounds of Formula (I) or (Ia)). Other embodiments include compositions comprising the inventive catalysts. Some embodiments include methods of using the inventive catalysts (e.g., in hydrofluorination of an organic compound). Further embodiments include methods for making the inventive catalysts. Additional embodiments of the invention are also discussed herein.

The disclosure provides Group 6 complexes, which, in some embodiments, are useful for catalyzing olefin metathesis reactions. In some embodiments, the compounds are compounds of the following formula:

##STR00001##

wherein: M is a Group 6 metal atom; X is an oxygen atom, NR.sup.5, NN(R.sup.5)(R.sup.5) or NOR.sup.5, R.sup.5 and R.sup.5 independently being various substituents, such as aryl or heteroaryl, each optionally substituted; n is 0 or 1; R.sup.z is a neutral ligand; R.sup.1 is hydrogen or an organic substituent; R.sup.2 is an aryl or heteroaryl group, each optionally substituted; R.sup.3 is an anionic ligand; and R.sup.4 is an anionic ligand, such as a pyrrolide, a pyrazolide, an imidazolide, an indolide, an azaindolide, or an indazolide, each optionally substituted.

The disclosure provides Group 6 complexes, which, in some embodiments, are useful for catalyzing olefin metathesis reactions. In some embodiments, the compounds are compounds of the following formula:

##STR00001##

wherein: M is a Group 6 metal atom; X is an oxygen atom, NR.sup.5, NN(R.sup.5)(R.sup.5) or NOR.sup.5, R.sup.5 and R.sup.5 independently being various substituents, such as aryl or heteroaryl, each optionally substituted; n is 0 or 1; R.sup.z is a neutral ligand; R.sup.1 is hydrogen or an organic substituent; R.sup.2 is an aryl or heteroaryl group, each optionally substituted; R.sup.3 is an anionic ligand; and R.sup.4 is an anionic ligand, such as a pyrrolide, a pyrazolide, an imidazolide, an indolide, an azaindolide, or an indazolide, each optionally substituted.