C07C211/33

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.

RESIST COMPOSITION AND PATTERNING PROCESS
20170075217 · 2017-03-16 · ·

A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.

Class A GPCR-binding compound modifier
12275687 · 2025-04-15 · ·

To provide a novel class-A GPCR antagonist, a production method therefor, or a novel compound that interacts with a Na.sup.+-water cluster binding site of a class-A GPCR. Used is a compound or a salt thereof comprising a structure comprising a class-A GPCR-binding compound linked to a functional group that can bind to a Na.sup.+-water cluster binding site of the class-A GPCR. Also used is a method for producing a class-A GPCR antagonist, comprising the step of linking one compound with another compound that can bind to a Na.sup.+-water cluster binding site of the class-A GPCR.

Class A GPCR-binding compound modifier
12275687 · 2025-04-15 · ·

To provide a novel class-A GPCR antagonist, a production method therefor, or a novel compound that interacts with a Na.sup.+-water cluster binding site of a class-A GPCR. Used is a compound or a salt thereof comprising a structure comprising a class-A GPCR-binding compound linked to a functional group that can bind to a Na.sup.+-water cluster binding site of the class-A GPCR. Also used is a method for producing a class-A GPCR antagonist, comprising the step of linking one compound with another compound that can bind to a Na.sup.+-water cluster binding site of the class-A GPCR.