In some embodiments, the present disclosure pertains to a compound, comprising a transition metal complex having the formula -[M (x,y)-L.sub.1 (w,v)-L.sub.2 (t,u)-L.sub.3].sup.p+An.sup..sub.mZ.sup..sub.p-m. In an embodiment of the present disclosure may be . In another embodiment may be . In some embodiments of the present disclosure, M is a transition metal. In a related embodiment, p is an integer corresponding to the oxidation state of M. In some embodiments of the present disclosure, each of x, y, w, v, t, and u independently comprise R. In other embodiments, each of x, y, w, v, t, and u independently comprise S. In an embodiment of the present disclosure, each of L.sub.1, L.sub.2, and L.sub.3 independently is a ligand comprising a substituted diamine. In some embodiments, An.sup. comprises a lipophilic anion, where m is from 1 to 3, and where Z.sup. comprises an optional second anion.

Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be sequential or simultaneous.