The present invention relates to novel Ruthenium complexes of formulae A1-A4 and their use, inter alia, for (1) dehydrogenative coupling of alcohols to esters; (2) hydrogenation of esters to alcohols (including hydrogenation of cyclic esters (lactones) or cyclic di-esters (di-lactones), or polyesters); (3) preparing amides from alcohols and amines—(including the preparation of polyamides (e.g., polypeptides) by reacting dialcohols and diamines and/or polymerization of amino alcohols and/or forming cyclic dipeptides from p-aminoalcohols; (4) hydrogenation of amides (including cyclic dipeptides, polypeptides and polyamides) to alcohols and amines; (5) hydrogenation of organic carbonates (including polycarbonates) to alcohols or hydrogenation of carbamates (including polycarbamates) or urea derivatives to alcohols and amines; (6) dehydrogenation of secondary alcohols to ketones; (7) amidation of esters (i.e., synthesis of amides from esters and amines); (8) acylation of alcohols using esters; (9) coupling of alcohols with water and a base to form carboxylic acids; and (10) preparation of amino acids or their salts by coupling of amino alcohols with water and a base. The present, invention further relates to the use of certain known Ruthenium complexes for the preparation of amino acids or their salts from amino alcohols.

The present invention relates to novel Ruthenium complexes of formulae A1-A4 and their use, inter alia, for (1) dehydrogenative coupling of alcohols to esters; (2) hydrogenation of esters to alcohols (including hydrogenation of cyclic esters (lactones) or cyclic di-esters (di-lactones), or polyesters); (3) preparing amides from alcohols and amines—(including the preparation of polyamides (e.g., polypeptides) by reacting dialcohols and diamines and/or polymerization of amino alcohols and/or forming cyclic dipeptides from p-aminoalcohols; (4) hydrogenation of amides (including cyclic dipeptides, polypeptides and polyamides) to alcohols and amines; (5) hydrogenation of organic carbonates (including polycarbonates) to alcohols or hydrogenation of carbamates (including polycarbamates) or urea derivatives to alcohols and amines; (6) dehydrogenation of secondary alcohols to ketones; (7) amidation of esters (i.e., synthesis of amides from esters and amines); (8) acylation of alcohols using esters; (9) coupling of alcohols with water and a base to form carboxylic acids; and (10) preparation of amino acids or their salts by coupling of amino alcohols with water and a base. The present, invention further relates to the use of certain known Ruthenium complexes for the preparation of amino acids or their salts from amino alcohols.

The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) an amino acid, ##STR00001##
wherein R.sup.A1 to R.sup.A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R.sup.A1 and R.sup.A2, or R.sup.A3 and R.sup.A4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, dose not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.

The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) an amino acid, ##STR00001##
wherein R.sup.A1 to R.sup.A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R.sup.A1 and R.sup.A2, or R.sup.A3 and R.sup.A4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, dose not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.

Provided is a method of making ethylenediaminetetraacetic acid (EDTA) comprising the steps: (a) providing a reaction mixture (a) comprising ethylenediamine (EDA) and glycolonitrile (GN), wherein reaction mixture (a) comprises 0% to 0.1% by weight, based on the weight of reaction mixture (a), of any base having pKa of the conjugate acid (PKaH) of 13 or higher; (b) causing or allowing reaction mixture (a) to react to form a dinitrile (DN) compound; (c) bringing the DN into contact with aqueous solution of a base having pKaH of 11 or higher, and causing or allowing the resulting mixture to react to form a diacid compound (DA); (d) causing or allowing the DA to react, either sequentially or simultaneously, with additional GN to form products (Pd); (e) causing or allowing products (Pd) to react with a base having pKaH of 11 or higher, to form EDTA. Also provided is a composition comprising a diacid/dinitrile compound (DADN) wherein each —R has the structure:

##STR00001##

Provided is a method of making ethylenediaminetetraacetic acid (EDTA) comprising the steps: (a) providing a reaction mixture (a) comprising ethylenediamine (EDA) and glycolonitrile (GN), wherein reaction mixture (a) comprises 0% to 0.1% by weight, based on the weight of reaction mixture (a), of any base having pKa of the conjugate acid (PKaH) of 13 or higher; (b) causing or allowing reaction mixture (a) to react to form a dinitrile (DN) compound; (c) bringing the DN into contact with aqueous solution of a base having pKaH of 11 or higher, and causing or allowing the resulting mixture to react to form a diacid compound (DA); (d) causing or allowing the DA to react, either sequentially or simultaneously, with additional GN to form products (Pd); (e) causing or allowing products (Pd) to react with a base having pKaH of 11 or higher, to form EDTA. Also provided is a composition comprising a diacid/dinitrile compound (DADN) wherein each —R has the structure:

##STR00001##

Provided is a method of making ethylenediaminetetraacetic acid (EDTA) comprising the steps: (a) providing a reaction mixture (a) comprising ethylenediamine (EDA) and glycolonitrile (GN), wherein reaction mixture (a) comprises 0% to 0.1% by weight, based on the weight of reaction mixture (a), of any base having pKa of the conjugate acid (PKaH) of 13 or higher; (b) causing or allowing reaction mixture (a) to react to form a dinitrile (DN) compound; (c) bringing the DN into contact with aqueous solution of a base having pKaH of 11 or higher, and causing or allowing the resulting mixture to react to form a diacid compound (DA); (d) causing or allowing the DA to react, either sequentially or simultaneously, with additional GN to form products (Pd); (e) causing or allowing products (Pd) to react with a base having pKaH of 11 or higher, to form EDTA. Also provided is a composition comprising a diacid/dinitrile compound (DADN) wherein each —R has the structure:

##STR00001##

The present invention provides methods of synthesizing D-α-methyldopa and L-α-methyldopa.

The present invention provides methods of synthesizing D-α-methyldopa and L-α-methyldopa.

The present invention provides methods of synthesizing D-α-methyldopa and L-α-methyldopa.