C07C261/02

THERMALLY CONDUCTIVE MATERIAL, DEVICE WITH THERMALLY CONDUCTIVE LAYER, COMPOSITION FOR FORMING THERMALLY CONDUCTIVE MATERIAL, AND DISK-LIKE LIQUID CRYSTAL COMPOUND

The present invention provides a thermally conductive material having excellent thermal conductivity. Furthermore, the present invention provides a device with a thermally conductive layer that has a thermally conductive layer containing the thermally conductive material and a composition for forming a thermally conductive material that is used for forming the thermally conductive material. The thermally conductive material according to an embodiment of the present invention contains a cured substance of a disk-like compound, which has one or more reactive functional groups selected from the group consisting of a hydroxyl group, a carboxylic acid group, a carboxylic acid anhydride group, an amino group, a cyanate ester group, and a thiol group, and a crosslinking compound which has a group reacting with the reactive functional groups.

Silicon-based energy storage devices with electrolyte containing cyanate based compounds

Electrolytes and electrolyte additives for energy storage devices comprising cyanate based compounds are disclosed. The energy storage device comprises a first electrode and a second electrode, wherein at least one of the first electrode and the second electrode is a Si-based electrode, a separator between the first electrode and the second electrode, an electrolyte comprising at least two electrolyte co-solvents, wherein at least one electrolyte co-solvent comprises a cyanate based compound.

Silicon-based energy storage devices with electrolyte containing cyanate based compounds

Electrolytes and electrolyte additives for energy storage devices comprising cyanate based compounds are disclosed. The energy storage device comprises a first electrode and a second electrode, wherein at least one of the first electrode and the second electrode is a Si-based electrode, a separator between the first electrode and the second electrode, an electrolyte comprising at least two electrolyte co-solvents, wherein at least one electrolyte co-solvent comprises a cyanate based compound.

Cyanate ester compound, curable resin composition containing the compound, and hardened product thereof

The present invention provides a novel cyanate ester compound which has excellent solvent solubility and from which a hardened product having a low coefficiency of thermal expansion and excellent flame retardancy and heat resistance is obtained. The present invention is a cyanate ester compound obtained by cyanating a naphthol-dihydroxynaphthalene aralkyl resin or a dihydroxynaphthalene aralkyl resin.

Cyanate ester compound, curable resin composition containing the compound, and hardened product thereof

The present invention provides a novel cyanate ester compound which has excellent solvent solubility and from which a hardened product having a low coefficiency of thermal expansion and excellent flame retardancy and heat resistance is obtained. The present invention is a cyanate ester compound obtained by cyanating a naphthol-dihydroxynaphthalene aralkyl resin or a dihydroxynaphthalene aralkyl resin.

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. ##STR00001##
(in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R.sup.0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m.sub.1 is independently an integer of 0 to 4, in which at least one m.sub.1 is an integer of 1 to 4, each m.sub.2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. ##STR00001##
(in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R.sup.0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m.sub.1 is independently an integer of 0 to 4, in which at least one m.sub.1 is an integer of 1 to 4, each m.sub.2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).

Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).

Polymeric materials made from vanillin

A method for converting vanillin to bis(cyanate) ester monomers, comprising treating vanillin with a reductive coupling agent to form at least one olefin. The olefin or olefins are treated with hydrogen and a metal catalyst to hydrogenate said olefin. The hydrogenated olefin or olefins are treated with at least one cyanogen halide and a base in an organic solvent to afford at least one olefin monomer. The olefin monomer or monomers are purified by recrystallization or precipitation from an organic solvent.