The present invention relates to a method for producing a substituted alkyl cycloalkanone, comprising the alkylation of a cycloalkanone with an alkene derivative in the presence of a metal oxide, where n is 2 to 20, m is 0 to 10, and R is a functional group.

The present invention relates to a method for producing a substituted alkyl cycloalkanone, comprising the alkylation of a cycloalkanone with an alkene derivative in the presence of a metal oxide, where n is 2 to 20, m is 0 to 10, and R is a functional group.

The invention relates to a thermal conversion vessel (200) used during amidification step of acetone cyanohydrin (ACH), in the industrial process for production of a methyl methacrylate (MMA) or methacrylic acid (MAA). The thermal conversion vessel (200) is used for converting an hydrolysis mixture of -hydroxyisobutyramide (HIBAM), -sulfatoisobutyramide (SIBAM), 2-methacrylamide (MACRYDE) and methacrylique acid (MAA), into a mixture of 2-methacrylamide (MACRYDE). at least one compartment (C1, C2, C3, . . . Ci) comprising an inner wall (206a, 206b, . . . 206i) separating said compartment into two communicating parts (C1a, C1b) by a passage provided between the bottom of said vessel and said inner wall, said compartment having a space above said inner wall, for separating gas phase from liquid phase during thermal conversion, said compartment being connected to an outlet valve (204a, 204b, . . . 204i). Such vessel allows obtaining a high yield thermal conversion in very safe conditions.

The invention relates to a thermal conversion vessel (200) used during amidification step of acetone cyanohydrin (ACH), in the industrial process for production of a methyl methacrylate (MMA) or methacrylic acid (MAA). The thermal conversion vessel (200) is used for converting an hydrolysis mixture of -hydroxyisobutyramide (HIBAM), -sulfatoisobutyramide (SIBAM), 2-methacrylamide (MACRYDE) and methacrylique acid (MAA), into a mixture of 2-methacrylamide (MACRYDE). at least one compartment (C1, C2, C3, . . . Ci) comprising an inner wall (206a, 206b, . . . 206i) separating said compartment into two communicating parts (C1a, C1b) by a passage provided between the bottom of said vessel and said inner wall, said compartment having a space above said inner wall, for separating gas phase from liquid phase during thermal conversion, said compartment being connected to an outlet valve (204a, 204b, . . . 204i). Such vessel allows obtaining a high yield thermal conversion in very safe conditions.

The invention relates to a thermal conversion vessel (200) used during amidification step of acetone cyanohydrin (ACH), in the industrial process for production of a methyl methacrylate (MMA) or methacrylic acid (MAA). The thermal conversion vessel (200) is used for converting an hydrolysis mixture of -hydroxyisobutyramide (HIBAM), -sulfatoisobutyramide (SIBAM), 2-methacrylamide (MACRYDE) and methacrylique acid (MAA), into a mixture of 2-methacrylamide (MACRYDE). at least one compartment (C1, C2, C3, . . . Ci) comprising an inner wall (206a, 206b, . . . 206i) separating said compartment into two communicating parts (C1a, C1b) by a passage provided between the bottom of said vessel and said inner wall, said compartment having a space above said inner wall, for separating gas phase from liquid phase during thermal conversion, said compartment being connected to an outlet valve (204a, 204b, . . . 204i). Such vessel allows obtaining a high yield thermal conversion in very safe conditions.

An alkyl sulfate ester containing a carbonyl group or a salt thereof. The compound is represented by the following formula:
R.sup.1C(O)(CR.sup.2.sub.2).sub.n(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-OSO.sub.3X
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, L, X, n, p and q are as defined herein. Also disclosed is a production method for making the alkyl sulfate ester.

An alkyl sulfate ester containing a carbonyl group or a salt thereof. The compound is represented by the following formula:
R.sup.1C(O)(CR.sup.2.sub.2).sub.n(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-OSO.sub.3X
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, L, X, n, p and q are as defined herein. Also disclosed is a production method for making the alkyl sulfate ester.

An alkyl sulfate ester containing a carbonyl group or a salt thereof. The compound is represented by the following formula:
R.sup.1C(O)(CR.sup.2.sub.2).sub.n(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-OSO.sub.3X
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, L, X, n, p and q are as defined herein. Also disclosed is a production method for making the alkyl sulfate ester.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.