The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.

A resist composition including a polymer; and a compound represented by Formula 1, ##STR00001## in Formula 1, R.sub.1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms, ##STR00002##

A resist composition including a polymer; and a compound represented by Formula 1, ##STR00001## in Formula 1, R.sub.1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms, ##STR00002##

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

To provide a compound which is high in sensitivity and which provides high resolution and high flatness. A compound represented by the following formula (P-0):

##STR00001##

wherein Ar is a group having an aryl group having 6 to 60 carbon atoms, each OR.sup.TS is independently a hydroxy group or a group having a specified ion moiety, and n.sup.1 is an integer of 1 to 20, provided that at least one OR.sup.TS is a group having a specified ion moiety.

To provide a compound which is high in sensitivity and which provides high resolution and high flatness. A compound represented by the following formula (P-0):

##STR00001##

wherein Ar is a group having an aryl group having 6 to 60 carbon atoms, each OR.sup.TS is independently a hydroxy group or a group having a specified ion moiety, and n.sup.1 is an integer of 1 to 20, provided that at least one OR.sup.TS is a group having a specified ion moiety.

The present invention provides novel antifibrinilytic compounds, processes for their preparation, pharmaceutical and veterinary compositions thereof, and their use in medicine, in particular for the treatment of bleeding.

A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R.sup.1, R.sup.2 and R.sup.3 are a C.sub.1-C.sub.20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.

##STR00001##

A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.