A method of preparing a cyclopropane ring-bearing compound of the formula I ##STR00001##
in which R.sup.1 and R.sup.2 are independently selected from C.sub.1-C.sub.10 alkyl, optionally substituted, or R.sup.1 and R.sup.2, together with the bonds linking them to the cyclopropane ring, form a monocyclic or bicyclic ring system, which may comprise at least one hetero-atom, comprising the reaction of a compound of formula II
R.sup.1CHCHR.sup.2II
in which R.sup.1 and R.sup.2 have the significances hereinabove defined, with a compound of formula III
XCH.sub.2YIII
in which X is a nucleofuge selected from halides and pseudohalides and Y is an electrofuge selected from boranes and borates, in the presence of a metal catalyst complex selected from those useful for catalytic cyclopropanation and those useful for catalyzing Heck coupling. The method provides a particularly easy and non-hazardous method of cyclopropanation.

A series of phenelzine analogs comprising a phenelzine scaffold linked to an aromatic moiety and their use as inhibitors of lysine-specific demethylase 1 (LSD1) and/or one or more histone deacetylases (HDACs) is provided. The presently disclosed phenelzine analogs exhibit potency and selectivity for LSD1 versus MAO and LSD2 enzymes and exhibit bulk, as well as, gene specific histone methylation changes, anti-proliferative activity in several cancer cell lines, and neuroprotection in response to oxidative stress. Accordingly, the presently disclosed phenelzine analogs can be used to treat diseases, conditions, or disorders related to LSD1 and/or HDACs, including, but not limited to, cancers and neurodegenerative diseases.

The invention provides protected ortho-quinone compounds comprising a group represented by:

##STR00001## where Ar is optionally substituted phenylene, X is selected from NH.sub.2, OH and SH, and the protected forms of each, W is optionally substituted methylene, such as methylene, and d is a double or single bond, and the salts and solvates thereof

Provided are an onium salt, a chemically amplified resist composition comprising the onium salt, and a pattern forming process using the chemically amplified resist composition, the chemically amplified resist composition exhibiting a high sensitivity, high resolution, improved lithography properties including EL, LWR, CDU and DOF, and resist pattern collapse resistance, when processed by photolithography using high-energy radiation independent of whether it is of positive or negative tone. An onium salt has the formula (1):

##STR00001##