Disclosed herein are a colored functionalized paracyclophane represented by Formula (I) and a colored chemical film represented by Formula (II): ##STR00001## wherein A, o, and p in Formula (I) and Formula (II) are as defined herein. The colored chemical film may be formed from the colored functionalized [2,2]paracyclophane by chemical vapor deposition.

Provided are a naphtol-type calixarene compound having high solvent solubility, a method for producing the naphthol-type calixarene compound, a photosensitive composition that contains the naphthol-type calixarene compound and provides a coating having high thermal decomposition resistance, alkali developability, photosensitivity, and resolution, and a resist material and a coating each being made of the photosensitive composition. Specifically, provided is a naphthol-type calixarene compound including a molecular structure represented by general formula (1). [In the formula (1), R.sup.1 represents a hydrogen atom, an alkyl group, an alkoxy group, an optionally substituted aryl group, an optionally substituted aralkyl group, or a halogen atom, and a plurality of R.sup.1 may be the same or different from each other; R.sup.2 represents an optionally substituted alkyl group or an optionally substituted aryl group; and n represents an integer of 2 to 10]. ##STR00001##

A compound useful as a release agent, and a release agent, a curable composition, and a nanoimprint lithography resin material each containing the compound are provided. More specifically, a calixarene compound with a molecular structure represented by the following structural formula (1) and a composition containing the calixarene compound are provided.

##STR00001##

wherein R.sup.1 denotes a structural moiety with a perfluoroalkyl group, R.sup.2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group, R.sup.3 denotes a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent, or an aryl group that may have a substituent, n denotes an integer in the range of 2 to 10, and * denotes a bonding point with an aromatic ring.

This invention relates to a one-pot synthesis of a high-purity calix[4]arene compound by reacting a phenolic compound and an aldehyde in the presence of at least one nitrogen-containing base as a catalyst to form the calix[8]arene compound, and cleaving the calix[8]arene compound into a high-purity calix[4]arene compound, directly, without carrying out a purification step before the cleaving step. The invention also relates to an improved conversion of a calix[8]arene compound to a calix[4]arene compound, by cleaving a calix[8]arene compound in a glycol ether solvent having a boiling point of at least about 200 C., to result in a high-purity calix[4]arene compound, without using an antisolvent.

The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3-dithiodipropionic acid (DPDPA) and N-ethyl-N-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.

A phenolic hydroxyl-containing compound is provided. The compound dissolves well in solvents and can be formulated into compositions that give coatings superior in thermal decomposition resistance, alkali developability, resolution, and dry-etch resistance. Specifically, the compound is a phenolic hydroxyl-containing calixarene represented by structural formula (1): ##STR00001##
(where A is a structural unit including a dihydroxynaphthalene- or naphthol-derived structure optionally with a substituent alkyl, alkoxy, aryl, or aralkyl group or halogen atom on the aromatic rings and a methylene group optionally having an alkyl or aryl group in place of one of the hydrogen atoms) and obtained using a dihydroxynaphthalene in combination with a naphthol, with the total repeat number p being an integer of 2 to 10.

The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3-dithiodipropionic acid (DPDPA) and N-ethyl-N-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.

A curable composition and a permanent resist film made using this curable composition are provided. The composition dissolves well in solvents, gives coatings superior in alkali developability, thermal decomposition resistance, light sensitivity, and resolution, and is particularly suitable for the formation of permanent resist films. Specifically, the composition is a curable composition for permanent resist films and contains a phenolic hydroxyl-containing compound (A) that has a molecular structure represented by structural formula (1): ##STR00001##
(where R.sup.1 is hydrogen, alkyl, or aryl, and n is an integer of 2 to 10; R.sup.2 is alkyl, alkoxy, aryl, aralkyl, or halogen, and m is an integer of 0 to 4; if m is 2 or more, the plurality of R.sup.2s may be the same or different from one another, and may be bonded to either of the two aromatic rings in the naphthylene structure) and a photosensitizer (B1) or curing agent (B2).

Disclosed herein are rechargeable aluminum organic batteries and active materials used therein. The cathodic materials used herein comprise a macrocycle comprising a substituted or unsubstituted phenanthrenequinone unit and a graphite flake.

This invention relates to materials for electrodes, to materials for lithium-ion batteries, and to materials for lithium-ion storage.