Patent classifications
C07D327/02
INSECTICIDAL COMPOUNDS
The present invention provides compounds of formula (I):
##STR00001## wherein A.sup.1, A.sup.2, A.sup.3 and A.sup.4 are independently of one another CH, CR.sup.5, or nitrogen; B.sup.1B.sup.2B.sup.3B.sup.4 is CH.sub.2CNCH.sub.2, CH.sub.2NCH.sub.2CH.sub.2, CH.sub.2CCHO or CHCCH.sub.2O; G.sup.1 is oxygen or sulfur; L is a single bond or C.sub.1-C.sub.8alkylene; R.sup.1 is hydrogen, C.sub.1-C.sub.8alkyl, C.sub.1-C.sub.8alkylcarbonyl-, C.sub.1-C.sub.8alkoxy, C.sub.2-C.sub.8alkenyl, C.sub.2-C.sub.8alkynyl, C.sub.1-C.sub.8alkoxy-C.sub.1-C.sub.8alkyl, aryl or aryl substituted by one to three R.sup.6, or R.sup.1 is heterocyclyl or heterocyclyl substituted by one to three R.sup.6 or C.sub.1-C.sub.8alkoxycarbonyl-; R.sup.2 is hydrogen, C.sub.1-C.sub.8haloalkyl or C.sub.1-C.sub.8alkyl; R.sup.3 is C.sub.1-C.sub.8haloalkyl; R.sup.4 is aryl or aryl substituted by one to three R.sup.6, or R.sup.4 is heterocyclyl or heterocyclyl substituted by one to three R.sup.6; Y.sup.1 is CR.sup.7R.sup.8, CO or CS; Y.sup.2, Y.sup.3 and Y.sup.4 are independently CR.sup.7R.sup.8, CO, CS, NR.sup.9, O, S, SO or SO.sub.2; wherein at least two adjacent ring atoms in the ring formed by Y.sup.1, Y.sup.2, Y.sup.3 and Y.sup.4 are heteroatoms; each R.sup.7 and R.sup.8 is independently hydrogen, halogen, C.sub.1-C.sub.8alkyl, or C.sub.1-C.sub.8haloalkyl; and R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 are as defined in the claims.
The invention also relates to processes and intermediates for preparing these compounds, to insecticidal, acaricidal, nematicidal and molluscicidal compositions comprising these compounds and to methods of using these compounds to control insect, acarine, nematode and mollusc pests.
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
A salt represented by the formula (I): ##STR00001## wherein R.sup.1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q.sup.1 and Q.sup.2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A.sup.1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R.sup.2 represents an acid-labile group; and m represents an integer of 0 to 3.
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
A salt represented by the formula (I): ##STR00001## wherein R.sup.1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q.sup.1 and Q.sup.2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A.sup.1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R.sup.2 represents an acid-labile group; and m represents an integer of 0 to 3.
Photoresist composition and method for producing photoresist pattern
A photoresist composition comprising a resin having an acid-labile group; a salt represented by the formula (I); and a salt represented by the formula (B1). ##STR00001##
Photoresist composition and method for producing photoresist pattern
A photoresist composition comprising a resin having an acid-labile group; a salt represented by the formula (I); and a salt represented by the formula (B1). ##STR00001##
Insecticidal compounds
The present invention provides compounds of formula (I): wherein A.sup.1, A.sup.2, A.sup.3 and A.sup.4 are independently of one another CH, CR.sup.5, or nitrogen; B.sup.1B.sup.2B.sup.3B.sup.4 is CH.sub.2CNCH.sub.2, CH.sub.2NCH.sub.2CH.sub.2, CH.sub.2CCH-0- or CHCCH.sub.2-0-; G.sup.1 is oxygen or sulfur; L is a single bond or C.sub.1-C.sub.8alkylene; R.sup.1 is hydrogen, C.sub.1-C.sub.8alkyl, C.sub.1-C.sub.8alkylcarbonyl-, C.sub.1-C.sub.8alkoxy, C.sub.2-C.sub.8alkenyl, C.sub.2-C.sub.8alkynyl, C.sub.1-C.sub.8alkoxy-C.sub.1-C.sub.8alkyl, aryl or aryl substituted by one to three R.sup.6, or R.sup.1 is heterocyclyl or heterocyclyl substituted by one to three R.sup.6 or C.sub.1-C.sub.8alkoxycarbonyl-; R.sup.2 is hydrogen, C.sub.1-C.sub.8haloalkyl or C.sub.1-C.sub.8alkyl; R.sup.3 is C.sub.1-C.sub.8haloalkyl; R.sup.4 is aryl or aryl substituted by one to three R.sup.6, or R.sup.4 is heterocyclyl or heterocyclyl substituted by one to three R.sup.6; Y.sup.1 is CR.sup.7R.sup.8, CO or CS; Y.sup.2, Y.sup.3 and Y.sup.4 are independently CR.sup.7R.sup.8, C=0, CS, NR.sup.9, O, S, SO or SO.sub.2; wherein at least two adjacent ring atoms in the ring formed by Y.sup.1, Y.sup.2, Y.sup.3 and Y.sup.4 are heteroatoms; each R.sup.7 and R.sup.8 is independently hydrogen, halogen, C.sub.1-C.sub.8alkyl, or C.sub.1-C.sub.8haloalkyl; and R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 are as defined in the claims. The invention also relates to processes and intermediates for preparing these compounds, to insecticidal, acaricidal, nematicidal and molluscicidal compositions comprising these compounds and to methods of using these compounds to control insect, acarine, nematode and mollusc pests. ##STR00001##
Insecticidal compounds
The present invention provides compounds of formula (I): wherein A.sup.1, A.sup.2, A.sup.3 and A.sup.4 are independently of one another CH, CR.sup.5, or nitrogen; B.sup.1B.sup.2B.sup.3B.sup.4 is CH.sub.2CNCH.sub.2, CH.sub.2NCH.sub.2CH.sub.2, CH.sub.2CCH-0- or CHCCH.sub.2-0-; G.sup.1 is oxygen or sulfur; L is a single bond or C.sub.1-C.sub.8alkylene; R.sup.1 is hydrogen, C.sub.1-C.sub.8alkyl, C.sub.1-C.sub.8alkylcarbonyl-, C.sub.1-C.sub.8alkoxy, C.sub.2-C.sub.8alkenyl, C.sub.2-C.sub.8alkynyl, C.sub.1-C.sub.8alkoxy-C.sub.1-C.sub.8alkyl, aryl or aryl substituted by one to three R.sup.6, or R.sup.1 is heterocyclyl or heterocyclyl substituted by one to three R.sup.6 or C.sub.1-C.sub.8alkoxycarbonyl-; R.sup.2 is hydrogen, C.sub.1-C.sub.8haloalkyl or C.sub.1-C.sub.8alkyl; R.sup.3 is C.sub.1-C.sub.8haloalkyl; R.sup.4 is aryl or aryl substituted by one to three R.sup.6, or R.sup.4 is heterocyclyl or heterocyclyl substituted by one to three R.sup.6; Y.sup.1 is CR.sup.7R.sup.8, CO or CS; Y.sup.2, Y.sup.3 and Y.sup.4 are independently CR.sup.7R.sup.8, C=0, CS, NR.sup.9, O, S, SO or SO.sub.2; wherein at least two adjacent ring atoms in the ring formed by Y.sup.1, Y.sup.2, Y.sup.3 and Y.sup.4 are heteroatoms; each R.sup.7 and R.sup.8 is independently hydrogen, halogen, C.sub.1-C.sub.8alkyl, or C.sub.1-C.sub.8haloalkyl; and R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 are as defined in the claims. The invention also relates to processes and intermediates for preparing these compounds, to insecticidal, acaricidal, nematicidal and molluscicidal compositions comprising these compounds and to methods of using these compounds to control insect, acarine, nematode and mollusc pests. ##STR00001##
Compositions for Conjugating a Sulfonephthalein Dye to a Substrate
The present invention provides derivatized indicator compounds, such as pH indicator compounds, which can be covalently immobilized to a variety of solid substrates to produce an indicator pad. Such pads can be used to monitor water quality in variety of settings. In particular, the pads of the invention are useful in devices which monitor the quality of recreational water, such as water in swimming pools, hot tubs, and amusement park attractions. including water slides, and water-based rides. The present invention overcomes the limitations of commercially available pad chemistries.
Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method
Provided is a monomer that improves solubility in organic solvents, hydrolyzability, and solubility in water after hydrolysis of a resin as well as imparts higher heat resistance to a resin. A resin for a photoresist containing a polymerization unit represented by Formula (Y), wherein R.sup.h represents a halogen atom or an alkyl group having from 1 to 6 carbons and having a halogen atom; R.sup.1 is a substituent attached to a ring and represents a halogen atom, an alkyl group that has from 1 to 6 carbons and may have a halogen atom, a hydroxyalkyl group that has from 1 to 6 carbons and may have a halogen atom and has a hydroxyl group moiety which may be protected by a protecting group, a carboxyl group that may form a salt, or a substituted oxycarbonyl group; A represents an alkylene group having from 1 to 6 carbons, an oxygen atom, a sulfur atom, or no bond; m is the number of R.sup.1 and represents an integer from 0 to 8; X represents an electron-withdrawing substituent; n is the number of X and represents an integer from 1 to 9; B represents a single bond or a linking group; and a steric position of a COOB-group attached to a polymer chain may be either endo or exo.
Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method
Provided is a monomer that improves solubility in organic solvents, hydrolyzability, and solubility in water after hydrolysis of a resin as well as imparts higher heat resistance to a resin. A resin for a photoresist containing a polymerization unit represented by Formula (Y), wherein R.sup.h represents a halogen atom or an alkyl group having from 1 to 6 carbons and having a halogen atom; R.sup.1 is a substituent attached to a ring and represents a halogen atom, an alkyl group that has from 1 to 6 carbons and may have a halogen atom, a hydroxyalkyl group that has from 1 to 6 carbons and may have a halogen atom and has a hydroxyl group moiety which may be protected by a protecting group, a carboxyl group that may form a salt, or a substituted oxycarbonyl group; A represents an alkylene group having from 1 to 6 carbons, an oxygen atom, a sulfur atom, or no bond; m is the number of R.sup.1 and represents an integer from 0 to 8; X represents an electron-withdrawing substituent; n is the number of X and represents an integer from 1 to 9; B represents a single bond or a linking group; and a steric position of a COOB-group attached to a polymer chain may be either endo or exo.