A process for producing an episulfide compound for an optical material of the present invention includes a step of chlorinating glycerin to obtain dichloropropanol; a step of epoxidizing the dichloropropanol to obtain epichlorohydrin; a step of reacting the epichlorohydrin with a sulfating agent to obtain a bis(chlorohydrin) (di)sulfide compound thought a thiol compound; a step of epoxidizing the bis(chlorohydrin) (di)sulfide compound under basic conditions to obtain an epoxy compound; and a step of reacting the epoxy compound with a sulfating agent to obtain an episulfide compound represented by following General Formula (1): ##STR00001## wherein, in the formula, n represents 0 or 1.

The invention provides compounds, compositions, and methods for the treatment of diseases, disorders, or conditions that are modulated by matrix metalloproteinases (MMPs). The compounds can be selective MMP inhibitors, for example, selective inhibitors of MMP-2, MMP-9, and/or MMP-14. The disease, disorder, or condition can include, for example, stroke, neurological disorders, ophthalmological disorders, or wounds, such as chronic wounds or diabetic wounds.

The invention provides compounds, compositions, and methods for the treatment of diseases, disorders, or conditions that are modulated by matrix metalloproteinases (MMPs). The compounds can be selective MMP inhibitors, for example, selective inhibitors of MMP-2, MMP-9, and/or MMP-14. The disease, disorder, or condition can include, for example, stroke, neurological disorders, ophthalmological disorders, or wounds, such as chronic wounds or diabetic wounds.

Provided is a thioepoxy group- and (meth)allyl group-containing compound represented by formula (1).

##STR00001##

(In the formula, R.sup.1 is a C2-20 trivalent or tetravalent hydrocarbon group. R.sup.2 is a hydrogen atom or a methyl group. n is 3 or 4.)

Provided is a thioepoxy group- and (meth)allyl group-containing compound represented by formula (1).

##STR00001##

(In the formula, R.sup.1 is a C2-20 trivalent or tetravalent hydrocarbon group. R.sup.2 is a hydrogen atom or a methyl group. n is 3 or 4.)

In a process for producing a (poly) sulfide compound represented by General Formula (2) of the present invention, thiol compounds represented by General Formula (1) are reacted with each other in the presence of a basic compound represented by General Formula (4) or General Formula (5) and sulfur.

##STR00001##

In a process for producing a (poly) sulfide compound represented by General Formula (2) of the present invention, thiol compounds represented by General Formula (1) are reacted with each other in the presence of a basic compound represented by General Formula (4) or General Formula (5) and sulfur.

##STR00001##

A novel compound for a light emitting device, and an organic light emitting device containing the same are disclosed. The compound for a light emitting device is represented by Formula 1 below:

##STR00001##

According to one preferred embodiment of the present invention, a composition for optical materials, which contains a compound represented by formula (1) and a compound represented by formula (2), is able to be provided. This composition for optical materials enables stable storage of a compound represented by formula (2) at low cost, and also enables stable storage thereof with respect to temperature change. In addition, this composition for optical materials enables the achievement of an optical material which has good light resistance. ##STR00001##
(In formula (1), in represents an integer of 0-4; and n represents an integer of 0-2.) ##STR00002##
(In formula (2), m represents an integer of 0-4; and n represents an integer of 0-2.)

According to one preferred embodiment of the present invention, a composition for optical materials, which contains a compound represented by formula (1) and a compound represented by formula (2), is able to be provided. This composition for optical materials enables stable storage of a compound represented by formula (2) at low cost, and also enables stable storage thereof with respect to temperature change. In addition, this composition for optical materials enables the achievement of an optical material which has good light resistance. ##STR00001##
(In formula (1), in represents an integer of 0-4; and n represents an integer of 0-2.) ##STR00002##
(In formula (2), m represents an integer of 0-4; and n represents an integer of 0-2.)