Patent classifications
C07D339/08
ACYLOXY SUBSTITUTED PHENYL DITHIANE DERIVATIVES
Para-acyl substituted diazacyclohexenes, medical formulations thereof and methods for making and using the same.
STYRYL CARBOXYLATE DERIVATIVES
Novel Styryl Carboxylate derivatives are provided which exhibit activity for the treatment of immunological diseases, inflammation, obesity, hyperlipidemia, hypertension, neurological diseases, and diabetes.
Flow battery that includes liquid containing mediator
A flow battery includes a first liquid containing a redox mediator, a first electrode, a first active material, and a first circulator that circulates the first liquid between the first electrode and the first active material. The redox mediator contains a heteranthrene compound. The redox mediator contains a heteranthrene compound. The heteranthrene compound has a skeletal structure including a central ring structure, the central ring structure containing no nitrogen.
Flow battery that includes liquid containing mediator
A flow battery includes a first liquid containing a redox mediator, a first electrode, a first active material, and a first circulator that circulates the first liquid between the first electrode and the first active material. The redox mediator contains a heteranthrene compound. The redox mediator contains a heteranthrene compound. The heteranthrene compound has a skeletal structure including a central ring structure, the central ring structure containing no nitrogen.
Nitrogen-containing compound, electronic element and electronic device
The present disclosure provides a nitrogen-containing compound, an electronic element and an electronic device, which belongs to the technical field of organic materials. The nitrogen-containing compound has a structure of Chemical Formula 1, wherein R.sub.1 and R.sub.2 are each independently selected from hydrogen or a group represented by Chemical Formula 1-1, and one and only one of R.sub.1 and R.sub.2 has the group of Chemical Formula 1-1; when R.sub.1 or R.sub.2 is selected from hydrogen, said R.sub.1 and R.sub.2 may be replaced by R.sub.4. The nitrogen-containing compound can improve the performance of electronic elements.
Nitrogen-containing compound, electronic element and electronic device
The present disclosure provides a nitrogen-containing compound, an electronic element and an electronic device, which belongs to the technical field of organic materials. The nitrogen-containing compound has a structure of Chemical Formula 1, wherein R.sub.1 and R.sub.2 are each independently selected from hydrogen or a group represented by Chemical Formula 1-1, and one and only one of R.sub.1 and R.sub.2 has the group of Chemical Formula 1-1; when R.sub.1 or R.sub.2 is selected from hydrogen, said R.sub.1 and R.sub.2 may be replaced by R.sub.4. The nitrogen-containing compound can improve the performance of electronic elements.
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACID GENERATOR, AND METHOD OF PRODUCING COMPOUND
A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion
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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACID GENERATOR, AND METHOD OF PRODUCING COMPOUND
A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion
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Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
The sulfonium salt does not contain a toxic metal and exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt. The heat- or photo-acid generator contains the sulfonium salt. The sulfonium salt is formed of a sulfonium cation selected from a group represented by general formulas (1), (9), (10) and (11) described below and a gallate anion represented by formula (a). The heat- or photo-acid generator contains the sulfonium salt. The heat- or energy ray-curable composition contains the acid generator and a cationically polymerizable compound. A cured product can be obtained by curing the same. ##STR00001##
Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
The sulfonium salt does not contain a toxic metal and exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt. The heat- or photo-acid generator contains the sulfonium salt. The sulfonium salt is formed of a sulfonium cation selected from a group represented by general formulas (1), (9), (10) and (11) described below and a gallate anion represented by formula (a). The heat- or photo-acid generator contains the sulfonium salt. The heat- or energy ray-curable composition contains the acid generator and a cationically polymerizable compound. A cured product can be obtained by curing the same. ##STR00001##