Provided are an electroluminescent material and a device thereof. The electroluminescent material is a metal complex having a ligand represented by Formula 1 and can be used as light-emitting materials in electroluminescent devices. These new metal complexes can effectively regulate and control the luminescence wavelength, reduce the drive voltage of electroluminescent devices, greatly improve the current efficiency, power efficiency and EQE of electroluminescent devices, prolong the device lifetime, and provide better device performance. Further provided are an electroluminescent device and a compound composition.

Provided are an electroluminescent material and a device thereof. The electroluminescent material is a metal complex having a ligand represented by Formula 1 and can be used as light-emitting materials in electroluminescent devices. These new metal complexes can effectively regulate and control the luminescence wavelength, reduce the drive voltage of electroluminescent devices, greatly improve the current efficiency, power efficiency and EQE of electroluminescent devices, prolong the device lifetime, and provide better device performance. Further provided are an electroluminescent device and a compound composition.

The present invention relates to a compound suitable as ligand for binding to the surface of a semiconductor nanoparticle, said compound comprising an anchor group, a linker group and an organic functional group; a semiconductor nanoparticle have said ligand attached to the outermost particle surface; a composition, a formulation and a process for the preparation of said semiconductor nanoparticle; and an electronic device.

The present invention relates to a compound suitable as ligand for binding to the surface of a semiconductor nanoparticle, said compound comprising an anchor group, a linker group and an organic functional group; a semiconductor nanoparticle have said ligand attached to the outermost particle surface; a composition, a formulation and a process for the preparation of said semiconductor nanoparticle; and an electronic device.

This invention relates to a Cu-BTC MOF which is water stable. The Cu-BTC MOF has been modified by substituting some of the BTC ligand (1,3,5, benzene tricarboxylic acid) with 5-aminoisophthalic acid (AIA). The resultant MOF retains at least 40% of its as synthesized surface area after exposure to liquid water at 60° C. for 6 hours. This is an unexpected result versus the MOF containing only the BTC ligand. This MOF can be used to abate contaminants such as ammonia in gas streams and especially air streams.

This invention relates to a Cu-BTC MOF which is water stable. The Cu-BTC MOF has been modified by substituting some of the BTC ligand (1,3,5, benzene tricarboxylic acid) with 5-aminoisophthalic acid (AIA). The resultant MOF retains at least 40% of its as synthesized surface area after exposure to liquid water at 60° C. for 6 hours. This is an unexpected result versus the MOF containing only the BTC ligand. This MOF can be used to abate contaminants such as ammonia in gas streams and especially air streams.

To provide a method for producing an amidinate metal complex which is represented by [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM in cost saving and simple manner.

A method for producing an amidinate metal complex represented by [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM including: a first step in which R.sup.3X is reacted with a metal Li in a solvent to obtain R.sup.3Li solution with LiX suspended therein; a second step in which the R.sup.3Li solution with LiX existing therein is reacted with R.sup.1—N═C═N—R.sup.2 to obtain a [R.sup.1—N—C(R.sup.3)—N—R.sup.2]Li solution with the LiX suspended therein; a third step in which the [R.sup.1—N—C(R.sup.3)—N—R.sup.2]Li solution with the LiX existing therein is reacted with MX to obtain an amidinate metal complex solution, represented by the [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM, with the LiX suspended therein; and a fourth step for removing the LiX in the solution obtained by the third step.

To provide a method for producing an amidinate metal complex which is represented by [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM in cost saving and simple manner.

A method for producing an amidinate metal complex represented by [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM including: a first step in which R.sup.3X is reacted with a metal Li in a solvent to obtain R.sup.3Li solution with LiX suspended therein; a second step in which the R.sup.3Li solution with LiX existing therein is reacted with R.sup.1—N═C═N—R.sup.2 to obtain a [R.sup.1—N—C(R.sup.3)—N—R.sup.2]Li solution with the LiX suspended therein; a third step in which the [R.sup.1—N—C(R.sup.3)—N—R.sup.2]Li solution with the LiX existing therein is reacted with MX to obtain an amidinate metal complex solution, represented by the [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM, with the LiX suspended therein; and a fourth step for removing the LiX in the solution obtained by the third step.

The present invention is directed to a process for continuous production of copper (I) nitrotetrazolate (DBX-1) by reacting aqueous copper salt with aqueous 5-nitrotetrazolate salt in the presence of a reducing agent. All the reactants are introduced into a continuous flow reactor system, which is composed of a temperature controlled tubular reactor and a mixer that allows for radial mixing. An optional stirred tank reactor may also be incorporated into the process to complete the reaction and allow for crystal growth.

The present invention is directed to a process for continuous production of copper (I) nitrotetrazolate (DBX-1) by reacting aqueous copper salt with aqueous 5-nitrotetrazolate salt in the presence of a reducing agent. All the reactants are introduced into a continuous flow reactor system, which is composed of a temperature controlled tubular reactor and a mixer that allows for radial mixing. An optional stirred tank reactor may also be incorporated into the process to complete the reaction and allow for crystal growth.