A compound selected from the group consisting of Formula I, Formula II, and Formula III,

##STR00001## wherein ring A, ring B, and ring C are independently a five-membered or six-membered, carbocyclic or heterocyclic ring, each of which is optionally aromatic; ring W of Formula I is a 6-membered heterocyclic ring, and ring W of Formula II or Formula III is a 5-membered or 6-membered heterocyclic ring; L is a monodentate ligand with a metal coordinating member selected from the group consisting of C, N, O, S, and P; and M is a metal selected from the group consisting of Cu, Au, and Ag.

The present invention relates to the technical field of organic compound synthesis, and particularly to a method for synthesizing silver (I) trifluoromethanethiolate. A method for synthesizing silver (I) trifluoromethanethiolate (CAS number: 811-68-7) is provided, which comprising synthesizing silver (I) trifluoromethanethiolate by using silver fluoride as a raw material, and using a trifluoromethanethiolate as a source providing trifluoromethylthio groups. In the present invention, the trifluoromethanethiolate is used as a source providing trifluoromethylthio groups, reacts with silver fluoride in a solvent to produce silver (I) trifluoromethanethiolate; and after separation and purification, a finished product of silver (I) trifluoromethanethiolate is obtained. The method for synthesizing silver (I) trifluoromethanethiolate according to the present invention has the advantages of readily available raw materials, easy preparation and low cost of reaction reagents and thus significantly reduced synthesis cost of silver (I) trifluoromethanethiolate, mild synthesis conditions, and simple and safe operations, thus facilitating the industrial production; and high utilization rate of silver atoms, and being green and environmentally friendly.

The present invention relates to the technical field of organic compound synthesis, and particularly to a method for synthesizing silver (I) trifluoromethanethiolate. A method for synthesizing silver (I) trifluoromethanethiolate (CAS number: 811-68-7) is provided, which comprising synthesizing silver (I) trifluoromethanethiolate by using silver fluoride as a raw material, and using a trifluoromethanethiolate as a source providing trifluoromethylthio groups. In the present invention, the trifluoromethanethiolate is used as a source providing trifluoromethylthio groups, reacts with silver fluoride in a solvent to produce silver (I) trifluoromethanethiolate; and after separation and purification, a finished product of silver (I) trifluoromethanethiolate is obtained. The method for synthesizing silver (I) trifluoromethanethiolate according to the present invention has the advantages of readily available raw materials, easy preparation and low cost of reaction reagents and thus significantly reduced synthesis cost of silver (I) trifluoromethanethiolate, mild synthesis conditions, and simple and safe operations, thus facilitating the industrial production; and high utilization rate of silver atoms, and being green and environmentally friendly.

A metal-EDTA compound/complex for combatting biofilms and/or treating wounds. The compound/complex comprises EDTA and from two to four metal ions. Of those two to four metal ions, at least two are different metal ions selected from Ag, Al, Au, Ba, Bi, Tl, Ce, Co, Cu, Fe, Ga, Ir, Mo, Rh, Ru, Ti, and Zn ions. The metal-EDTA compound/complex may exhibit any one or more of anti-microbial, anti-biofilm and anti-inflammatory activities in use and may increase the susceptibility of a biofilm and the microorganisms within said biofilm to attack by anti-microbial agents, helping to remove and sanitise the biofilm. A composition, wound dressing and medical device comprising the metal-EDTA complex are also provided. Uses of the metal-EDTA compound/complex as a medicament and/or to sanitise and/or substantially remove a biofilm from a substrate are also disclosed.

A metal-EDTA compound/complex for combatting biofilms and/or treating wounds. The compound/complex comprises EDTA and from two to four metal ions. Of those two to four metal ions, at least two are different metal ions selected from Ag, Al, Au, Ba, Bi, Tl, Ce, Co, Cu, Fe, Ga, Ir, Mo, Rh, Ru, Ti, and Zn ions. The metal-EDTA compound/complex may exhibit any one or more of anti-microbial, anti-biofilm and anti-inflammatory activities in use and may increase the susceptibility of a biofilm and the microorganisms within said biofilm to attack by anti-microbial agents, helping to remove and sanitise the biofilm. A composition, wound dressing and medical device comprising the metal-EDTA complex are also provided. Uses of the metal-EDTA compound/complex as a medicament and/or to sanitise and/or substantially remove a biofilm from a substrate are also disclosed.

A non-aqueous silver precursor composition is composed of (a) one or more cellulosic polymers; (b) reducible silver ions that are present at a weight ratio to the one or more cellulosic polymers of 5:1 to 50:1; (c) an organic solvent that has a boiling point at atmospheric pressure of at least 100 C. and up to but less than 500 C.; and (d) a nitrogenous base having a pKa in acetonitrile of at least 15 and up to and including 25 at 25 C. The Hansen parameter (.sub.T.sup.Polymer) of each cellulosic polymer is less than or equal to the Hansen parameter (.sub.T.sup.Solvent) each organic solvent. In addition, the (d) nitrogenous base is present in an equimolar amount or molar excess in relation to the amount of (b) reducible silver ions.

Disclosed herein are metal complexes that exhibit multiple radiative decay mechanisms, together with methods for the preparation and use thereof.

Disclosed herein are metal complexes that exhibit multiple radiative decay mechanisms, together with methods for the preparation and use thereof.

An ink composition including a metal salt amine complex; wherein the metal salt amine complex is formed from a metal salt and an amine; a compound selected from the group consisting of a stable free radical, a photoacid generator, and a thermal acid generator; and an optional solvent. A process including forming a metal salt amine complex; adding a compound selected from the group consisting of a stable free radical, a photoacid generator, and a thermal acid generator to the metal salt amine complex to form an ink. A process including providing an ink composition comprising a metal salt amine complex, wherein the metal salt amine complex is formed from a metal salt and an amine; a compound selected from the group consisting of a stable free radical, a photoacid generator, and a thermal acid generator; and an optional solvent; depositing the ink composition onto a substrate to form deposited features; and treating the deposited features on the substrate to form conductive features on the substrate.

An ink composition including a metal salt amine complex; wherein the metal salt amine complex is formed from a metal salt and an amine; a compound selected from the group consisting of a stable free radical, a photoacid generator, and a thermal acid generator; and an optional solvent. A process including forming a metal salt amine complex; adding a compound selected from the group consisting of a stable free radical, a photoacid generator, and a thermal acid generator to the metal salt amine complex to form an ink. A process including providing an ink composition comprising a metal salt amine complex, wherein the metal salt amine complex is formed from a metal salt and an amine; a compound selected from the group consisting of a stable free radical, a photoacid generator, and a thermal acid generator; and an optional solvent; depositing the ink composition onto a substrate to form deposited features; and treating the deposited features on the substrate to form conductive features on the substrate.