Patent classifications
C07F7/02
Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same
Provided are a novel disilylamine compound, a method for preparing same, and a composition for depositing a silicon-containing thin film including the same. A disilylamine compound of the present invention has excellent reactivity, is thermally stable, and has high volatility, and thus, is used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film.
NANOSILICON MATERIAL PREPARATION FOR FUNCTIONALIZED GROUP IVA PARTICLE FRAMEWORKS
Functionalized Group IVA particles, methods of preparing the Group IVA particles, and methods of using the Group IVA particles are provided. The Group IVA particles may be passivated with at least one layer of material covering at least a portion of the particle. The layer of material may be a covalently bonded non-dielectric layer of material. The Group IVA particles may be used in various technologies, including lithium ion batteries and photovoltaic cells.
Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane
A method of making an organoaminosilane compound, comprising i) combining A) a compound comprising a primary or secondary amine, B) monosilane (SiH.sub.4), and C) a catalyst, where the catalyst comprises magnesium or boron, where A), B) and C) are combined under sufficient conditions to form the organoaminosilane compound and hydrogen. A method of making a silylamine, the method comprising: i) forming an organoaminosilane compound by i) combining A) a compound comprising a primary or secondary amine, B) monosilane (SiH.sub.4), and C) a catalyst, where the catalyst comprises magnesium or boron, and ii) combining ammonia and the organoaminosilane compound produced in i) under sufficient conditions to form a silylamine product and a byproduct, where the byproduct is a primary or secondary amine.
MICROPOROUS ZIRCONIUM SILICATE FOR THE TREATMENT OF HYPERKALEMIA
The present invention relates to novel microporous zirconium silicate compositions that are formulated to remove toxins, e.g. potassium ions, from the gastrointestinal tract at an elevated rate without causing undesirable side effects. The preferred formulations are designed avoid increase in pH of urine in patients and/or avoid potential entry of particles into the bloodstream of the patient. Also disclosed is a method for preparing high purity crystals of UZSi-9 exhibiting an enhanced level of potassium exchange capacity. These compositions are particularly useful in the therapeutic treatment of hyperkalemia.
Synthesis of disilanylamines through transamination
The present invention provides processes for preparing silanylamines, such as disilanylamines and polysilanylamines, and compositions comprising the silanylamines. In one embodiment, the present invention provides processes for preparing a silanylamine compound, the processes comprising reacting a starting compound of general formula RR.sup.1N(Si.sub.xH.sub.2x+1) with an amine compound of general formula R.sup.2R.sup.3NH to produce the silanylamine compound of general formula R.sup.2.sub.mR.sup.3.sub.nN(Si.sub.xH.sub.2+1).sub.3-m-n.
SILANE COMPOUND
An etchant composition includes a silane compound represented by the following Chemical Formula 1:
##STR00001## wherein R.sup.1 to R.sup.6 are independently hydrogen, halogen, a substituted or unsubstituted C.sub.1-C.sub.20 hydrocarbyl group, a phenyl group, a C.sub.1-C.sub.20 alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri(C.sub.1-C.sub.20) alkylsilyl group, a phosphoryl group, or a cyano group, L is a direct bond or C.sub.1-C.sub.3 hydrocarbylene, A is an n-valent radical, and n is an integer of 1 to 4.
CHEMICAL SOLUTION FOR FORMING WATER-REPELLENT PROTECTIVE FILM, METHOD FOR PREPARING SAME, AND METHOD FOR MANUFACTURING SURFACE-TREATED BODY
The present invention is directed to a liquid chemical for forming a water-repellent protective film on a silicon element-containing wafer surface, a method of preparing the liquid chemical and a method of manufacturing a surface-treated body with the use of the liquid chemical, wherein the liquid chemical includes the following components: (I) a silylation agent; (II) at least one kind of nitrogen-containing compound selected from the group consisting of those of the following general formulas [1] and [2]; and (III) an organic solvent.
##STR00001##
METHOD FOR CONTINUOUS PRODUCTION OF TETRAALKOXYSILANE
The present disclosure relates to a method for producing tetraalkoxysilane continuously through direction of silicon metal with alcohol. In the method, a basic catalyst prepared in the absence of a solvent is used. Thus, it is possible to increase the proportion of the catalyst in the process, and to minimize production of impurities caused by solvent decomposition. In addition, it is possible to improve reaction efficiency and to simplify the purification process as compared to the method based on direct reaction according to the related art, and thus to produce tetraalkoxysilane with significantly higher cost efficiency as compared to the related art.
Compositions And Methods For The Deposition Of Silicon Oxide Films
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B:
##STR00001##
as defined herein.
Organosiloxane compounds as active ingredients in fluorine free fire suppression foams
Novel organosiloxane compounds are disclosed that are useful in firefighting foams. Methods of making and using the organosiloxane compounds and foams are also described.