A metal complex of the formula (1)

InCyLMZ.sub.p  (1), wherein M is a group 4 metal Z is an anionic ligand, p is number of 1 to 2, preferably 2, InCy is an indole fused cyclopentadienyl-type ligand of the formula (2)

##STR00001## wherein R.sup.1 means for each index m individually a C.sub.1-C.sub.4-alkyl that substitutes a hydrogen atom of the benzene ring, m is a number of 0 to 4, preferably 0 to 2, in particular 0, R.sup.2 means C.sub.1-C.sub.10-alkyl, C.sub.5-C.sub.10-cycloalkyl, and an unsubstituted or C.sub.1-C.sub.10-alkyl or C.sub.1-C.sub.4-dialkyl amino substituted C.sub.6-C.sub.10-aryl, in particular C.sub.1-C.sub.4-alkyl substituted phenyl, more preferably methyl, phenyl or di-C.sub.1-C.sub.4-alkyl substituted phenyl, in particular di-tert.-butyl-phenyl, R.sup.3, R.sup.4 and R.sup.5 being individually selected from the group of hydrogen, C.sub.1-C.sub.4-alkyl, unsubstituted or C.sub.1-C.sub.4-alkyl and/or halogen, in particular chlorine or fluorine substituted C.sub.6-C.sub.10-aryl, in particular unsubstituted or C.sub.1-C.sub.4-alkyl substituted phenyl whereby preferably R.sup.3, R.sup.4 and R.sup.5 being individually selected from the group of hydrogen, C.sub.1-C.sub.4-alkyl, unsubstituted or C.sub.1-C.sub.4-alkyl and/or halogen, in particular chlorine or fluorine substituted C.sub.6-C.sub.10-aryl, in particular C.sub.1-C.sub.4-alkyl substituted phenyl, more preferably at least one of the radicals R.sup.3 to R.sup.5 shall mean C.sub.1-C.sub.4-alkyl, in particular methyl, i-propyl and phenyl and, L is an amidinate ligand of the formula (3)

##STR00002## wherein the amidine-containing ligand is covalently bonded to the metal M via the imine nitrogen atom, and Sub.sub.1 is an unsubstituted or C.sub.1-C.sub.4-alkyl and/or halogen, in particular chlorine or fluorine substituted C.sub.6-C.sub.10-aromatic substituent, in particular phenyl and Sub.sub.2 is a substituent comprising a heteroatom of group 15, through which Sub.sub.2 is bonded to the imine carbon atom or Sub.sub.1 and Sub.sub.2 together with the imino group they are connected to form a ligand of formula (3a)

##STR00003## wherein the amidine-containing ligand (3a) is covalently bonded to the metal M via the imine nitrogen atom N.sup.2, wherein the benzo ring fused to the amidine ring may be unsubstituted or contain further substituents R.sup.7, which are individually of the index “q” selected from the group of hydrogen, C.sub.1-C.sub.4-alkyl and halogen and whereby q is a number of 0 to 4, preferably 0 to 2, most preferably 0, Sub.sub.4

The present invention relates to a new family of titanium heterometallic structured metal-organic materials (MOFs) having, among other characteristics, high porosity, stability in an aqueous medium and photocatalytic activity under visible light and UV radiation. The new family of materials has a structural unit that combines tetravalent titanium with multiple combinations of divalent metals with a homogeneous distribution at atomic level in the MOF structure.

The invention also relates to methods for obtaining them with high yields, in addition to their uses in the generation of solar fuels, photoactivated degradation, photoreduction of CO.sub.2, heterogeneous catalysis, as a component or part of an electronic component and/or as a porous or photoactive coating for controlling pollutants, inter alia.

The present invention relates to a new family of titanium heterometallic structured metal-organic materials (MOFs) having, among other characteristics, high porosity, stability in an aqueous medium and photocatalytic activity under visible light and UV radiation. The new family of materials has a structural unit that combines tetravalent titanium with multiple combinations of divalent metals with a homogeneous distribution at atomic level in the MOF structure.

The invention also relates to methods for obtaining them with high yields, in addition to their uses in the generation of solar fuels, photoactivated degradation, photoreduction of CO.sub.2, heterogeneous catalysis, as a component or part of an electronic component and/or as a porous or photoactive coating for controlling pollutants, inter alia.

Group 4 transition metal-containing film forming compositions comprising Group 4 transition metal azatrane precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.

Group 4 transition metal-containing film forming compositions comprising Group 4 transition metal azatrane precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.

Provided are a novel metal triamine compound, a method for preparing the same, a composition for depositing a metal-containing thin film including the same, and a method for preparing a metal-containing thin film using the same. The metal triamine compound of the present invention has excellent reactivity, is thermally stable, has high volatility, and has high storage stability, and thus, it may be used as a metal-containing precursor to easily prepare a high-purity metal-containing thin film having high density.

Provided are a novel metal triamine compound, a method for preparing the same, a composition for depositing a metal-containing thin film including the same, and a method for preparing a metal-containing thin film using the same. The metal triamine compound of the present invention has excellent reactivity, is thermally stable, has high volatility, and has high storage stability, and thus, it may be used as a metal-containing precursor to easily prepare a high-purity metal-containing thin film having high density.

The present disclosure provides an aerogel precursor including an alkoxydisiloxane-based prepolymer and having a functional group derived from a hydrophobic sol-gel forming agent of the following Chemical Formula 1 on a surface thereof, and therefore, capable of enhancing high temperature thermal stability of an aerogel providing hydrophobic pores having uniform pore size distribution when preparing an aerogel, and an aerogel prepared using the same: ##STR00001## (in Chemical Formula 1, M, R, R.sup.1 to R.sup.4 are the same as defined in the specification.)

The present disclosure provides an aerogel precursor including an alkoxydisiloxane-based prepolymer and having a functional group derived from a hydrophobic sol-gel forming agent of the following Chemical Formula 1 on a surface thereof, and therefore, capable of enhancing high temperature thermal stability of an aerogel providing hydrophobic pores having uniform pore size distribution when preparing an aerogel, and an aerogel prepared using the same: ##STR00001## (in Chemical Formula 1, M, R, R.sup.1 to R.sup.4 are the same as defined in the specification.)

The present invention relates to a transition metal organic framework, comprising: a transition metal oxide having antibacterial or antifungal properties; and an organic compound having at least one hydrophilic functional group, wherein the organic compound is bound to the transition metal oxide to surround the transition metal oxide and the hydrophilic functional group is placed toward the outside of the transition metal organic framework.