A resin composition for forming a phase-separated structure containing a block copolymer having a first block and a second block, in which the first block is formed of a constituent unit represented by Formula (b1), the second block is formed of a constituent unit represented by Formula (b2m) and a random copolymer having a constituent unit represented by Formula (b2g), and a ratio of a volume of the first block is 20% to 80% by volume. In the formulas, R.sup.1 is a hydrogen atom or an alkyl group, R.sup.b1 is a hydrogen atom or a methyl group, R.sup.2 is an alkyl group which may have a silicon atom, a fluorine atom, a carboxy group, an amino group, a hydroxy group, or a phosphoric acid group, R.sup.3 is a linear or branched alkylene group having 1 to 10 carbon atoms, which may have a hydroxy group, and R.sup.b2 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms ##STR00001##

In one example, an unsaturated cyclic dione is coupled to the substrate, and is reacted with an indole or indazole including a first functional group to form a first adduct coupling the first functional group to the substrate. In another example, an unsaturated cyclic dione is coupled to a substrate and reacted with a diene including a functional group to form an adduct coupling the functional group to the substrate. In another example, an indole or indazole is coupled to a substrate, and is reacted with an unsaturated cyclic dione including an oligonucleotide to form an adduct coupling the oligonucleotide to the substrate. In another example, a diene is coupled to a substrate, and is reacted with an unsaturated cyclic dione including an oligonucleotide to form an adduct coupling the oligonucleotide to the substrate.

In one example, an unsaturated cyclic dione is coupled to the substrate, and is reacted with an indole or indazole including a first functional group to form a first adduct coupling the first functional group to the substrate. In another example, an unsaturated cyclic dione is coupled to a substrate and reacted with a diene including a functional group to form an adduct coupling the functional group to the substrate. In another example, an indole or indazole is coupled to a substrate, and is reacted with an unsaturated cyclic dione including an oligonucleotide to form an adduct coupling the oligonucleotide to the substrate. In another example, a diene is coupled to a substrate, and is reacted with an unsaturated cyclic dione including an oligonucleotide to form an adduct coupling the oligonucleotide to the substrate.

This invention relates to a process to produce an ionomer comprising: 1) contacting, in a reactor, one or more C.sub.2-C.sub.60 α-olefins, an optional diene, and a metal alkenyl with a catalyst system comprising an activator, a catalyst compound, and a support; 2) forming a copolymer comprising one or more C.sub.2-C.sub.60 α-olefin monomers and about 0.01 wt % to about 20 wt %, based on the weight of the copolymer, of metal alkenyl; 3) functionalizing and quenching the polymerization reaction with one or more electrophilic groups; and 4) obtaining ionomer.

This invention relates to a process to produce an ionomer comprising: 1) contacting, in a reactor, one or more C.sub.2-C.sub.60 α-olefins, an optional diene, and a metal alkenyl with a catalyst system comprising an activator, a catalyst compound, and a support; 2) forming a copolymer comprising one or more C.sub.2-C.sub.60 α-olefin monomers and about 0.01 wt % to about 20 wt %, based on the weight of the copolymer, of metal alkenyl; 3) functionalizing and quenching the polymerization reaction with one or more electrophilic groups; and 4) obtaining ionomer.

A copolymer including units derived from fluoro monomers of formula (I):

CX.sub.1X.sub.2═CX.sub.3X.sub.4  (I) in which each of the X.sub.1, X.sub.2, X.sub.3 and X.sub.4 is independently chosen from H, F and alkyl groups including from 1 to 3 carbon atoms which are optionally partially or totally fluorinated, the H and/or F atoms of the fluoro monomers being partially replaced with photoactive groups of formula —Y—Ar—R in the copolymer; Y representing an oxygen atom or an NH group or a sulfur atom, Ar representing an aryl group, preferably a phenyl group, and R being a monodentate or bidentate group including from 1 to 30 carbon atoms. The fluoro monomers of formula (I) of the copolymer include vinylidene fluoride and trifluoroethylene. Also, a process for preparing this copolymer, a composition including this copolymer, and a film obtained from the copolymer.

A copolymer including units derived from fluoro monomers of formula (I):

CX.sub.1X.sub.2═CX.sub.3X.sub.4  (I) in which each of the X.sub.1, X.sub.2, X.sub.3 and X.sub.4 is independently chosen from H, F and alkyl groups including from 1 to 3 carbon atoms which are optionally partially or totally fluorinated, the H and/or F atoms of the fluoro monomers being partially replaced with photoactive groups of formula —Y—Ar—R in the copolymer; Y representing an oxygen atom or an NH group or a sulfur atom, Ar representing an aryl group, preferably a phenyl group, and R being a monodentate or bidentate group including from 1 to 30 carbon atoms. The fluoro monomers of formula (I) of the copolymer include vinylidene fluoride and trifluoroethylene. Also, a process for preparing this copolymer, a composition including this copolymer, and a film obtained from the copolymer.

A hot melt adhesive composition is provided that includes: a diblock copolymer including a styrene-based monomer-derived unit and a conjugated diene-based monomer-derived unit; a triblock copolymer which is a coupled polymer of the diblock copolymer; and a crosslinked block copolymer including a crosslinking agent-derived crosslinked part crosslinked with two or more of the diblock copolymer and the triblock copolymer. The conjugated diene-based monomer-derived unit includes an isoprene-derived unit and an epoxidized isoprene rubber.

A hot melt adhesive composition is provided that includes: a diblock copolymer including a styrene-based monomer-derived unit and a conjugated diene-based monomer-derived unit; a triblock copolymer which is a coupled polymer of the diblock copolymer; and a crosslinked block copolymer including a crosslinking agent-derived crosslinked part crosslinked with two or more of the diblock copolymer and the triblock copolymer. The conjugated diene-based monomer-derived unit includes an isoprene-derived unit and an epoxidized isoprene rubber.

A resin composition for forming a phase-separated structure containing a block copolymer having a first block and a second block, in which the first block is formed of a constituent unit represented by Formula (b1), the second block is formed of a constituent unit represented by Formula (b2m) and a random copolymer having a constituent unit represented by Formula (b2g), and a ratio of a volume of the first block is 20% to 80% by volume. In the formulas, R.sup.1 is a hydrogen atom or an alkyl group, R.sup.b1 is a hydrogen atom or a methyl group, R.sup.2 is an alkyl group which may have a silicon atom, a fluorine atom, a carboxy group, an amino group, a hydroxy group, or a phosphoric acid group, R.sup.3 is a linear or branched alkylene group having 1 to 10 carbon atoms, which may have a hydroxy group, and R.sup.b2 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms

##STR00001##