A wax inhibitor composition, the composition having at least one alpha-olefin maleic anhydride copolymer of the formula: ##STR00001##
wherein R.sub.1 is selected from hydrocarbyl groups containing 10-30 carbon atoms, and R.sub.2 is selected from a hydrogen or hydrocarbyl groups containing 10-80 carbon atoms, and R.sub.2, if not hydrogen, is broadly dispersed, wherein R.sub.2 comprises a weight fraction of carbon numbers greater than 30, wherein R.sub.2 can be the same or different, and n is a number of repeating units ranging from 1 to 100.

The invention relates to compositions of hydroxyl functional acrylic resins (acrylic polyols) comprising a mixture of α,α-branched alkane carboxylic glycidyl esters derived from butene oligomers characterized in that the sum of the concentration of the blocked and of the highly branched isomers is at least 50%, preferably above 60% and most preferably above 75% on total composition.

The invention relates to compositions of hydroxyl functional acrylic resins (acrylic polyols) comprising a mixture of α,α-branched alkane carboxylic glycidyl esters derived from butene oligomers characterized in that the sum of the concentration of the blocked and of the highly branched isomers is at least 50%, preferably above 60% and most preferably above 75% on total composition.

The present disclosure relates to a method for producing polymer microparticles, this method including a step for polymerizing vinyl monomers in a hydrophilic solvent, which dissolves the vinyl monomers and a dispersion stabilizer but does not dissolve a polymer formed, in the presence of the dispersion stabilizer. The present disclosure is a method for producing these polymer microparticles, wherein the dispersion stabilizer contains a macromonomer having carboxyl groups and ethylenically unsaturated groups at an intermediate location in a molecular chain thereof, the macromonomer has, on average, 1.4 to 2.5 ethylenically unsaturated groups per molecule, and an average value of a carboxyl group content in the macromonomer is 0.5 meq/g to 2.5 meq/g.

The present disclosure relates to a method for producing polymer microparticles, this method including a step for polymerizing vinyl monomers in a hydrophilic solvent, which dissolves the vinyl monomers and a dispersion stabilizer but does not dissolve a polymer formed, in the presence of the dispersion stabilizer. The present disclosure is a method for producing these polymer microparticles, wherein the dispersion stabilizer contains a macromonomer having carboxyl groups and ethylenically unsaturated groups at an intermediate location in a molecular chain thereof, the macromonomer has, on average, 1.4 to 2.5 ethylenically unsaturated groups per molecule, and an average value of a carboxyl group content in the macromonomer is 0.5 meq/g to 2.5 meq/g.

A Polymer used as a treatment means, having an acid number greater than 100. The Polymer has a valent metal ion which is bonded to at least one reactive group. The characteristics of the Polymer include, conductivities of 4 S/cm to 200 S/cm or more, depending upon the concentration and nature of the metal bound. The conductivity proportional to the amount of metal bound, the ability of the Polymer to bind metals having a +1, +2, +3, +4, or +5 valence charge to the Polymer, and the ability to bind two or more different metals to separate binding sites on the Polymer.

Disclosed are reactive functionalized, PIB grafted polymers having an architecture of one or more pendent polyisobutylene moieties grafted on to an organic backbone, wherein the backbone is not polyisobutylene and contains at least one telechelic, reactive functionality. Also a process for making the reactive functionalized, PIB grafted polymer s and curable compositions comprising the reactive functionalized, PIB grafted polymers.

Disclosed are reactive functionalized, PIB grafted polymers having an architecture of one or more pendent polyisobutylene moieties grafted on to an organic backbone, wherein the backbone is not polyisobutylene and contains at least one telechelic, reactive functionality. Also a process for making the reactive functionalized, PIB grafted polymer s and curable compositions comprising the reactive functionalized, PIB grafted polymers.

A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a fourth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.

The invention provides active energy ray curable compositions which exhibit good curability with active energy rays and which have a low viscosity to attain excellent application properties when applied as materials such as adhesives or coatings onto substrates and can give highly flexible cured products upon irradiation with active energy rays. An active energy ray curable composition includes a (meth)acrylic triblock copolymer (A) including a (meth)acrylic polymer block(s) (aA) having an active energy ray curable group containing a partial structure represented by the following general formula (1), and a (meth)acrylic polymer block(s) (bA) having no active energy ray curable groups, and a (meth)acrylic diblock copolymer (B) including a (meth)acrylic polymer block (aB) having an active energy ray curable group containing a partial structure represented by the following general formula (1), and a (meth)acrylic polymer block (bB) having no active energy ray curable groups, the composition having a ratio of Mn (bB)/Mn (bA) in the range of 0.2 to 2.0 wherein Mn (bB) is the number average molecular weight of the (meth)acrylic polymer block (bB) present in the (meth)acrylic diblock copolymer (B), and Mn (bA) is the number average molecular weight of the (meth)acrylic polymer block (bA) present in the (meth)acrylic triblock copolymer (A).

##STR00001## (In the formula, R.sup.1 is a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms.)