Use of a coating composition for making a frost resistant substrate, the coating composition comprises at least one copolymer (ZW-CA) comprising: (a) repeating units (RZW) derived from at least one zwitterionic monomer, monomer (B), and (b) repeating units (RCA) derived from at least one monomer containing carboxylic acid and/or carboxylic anhydride, monomer (B), and at least one crosslinking agent (CL).

The present invention provides an adhesive composition that exhibits excellent adhesive force, and can be easily separated by photocuring during a peeling step, in which foaming and lifting are not generated even after a high temperature process.

The present invention provides an adhesive composition that exhibits excellent adhesive force, and can be easily separated by photocuring during a peeling step, in which foaming and lifting are not generated even after a high temperature process.

A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Re.sup.e0 represents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom. ##STR00001##

A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Re.sup.e0 represents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom. ##STR00001##

A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Re.sup.e0 represents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom. ##STR00001##

A surface modification sheet (X) of the present invention includes a release sheet (10) and a surface modification layer (20) thereon. The surface modification layer (20) contains a polymer having a side chain containing an ethylenic double bond. The side chain of the polymer preferably includes a unit derived from an isocyanate compound containing the ethylenic double bond.

Provided is a backgrinding tape, which has an excellent unevenness-embedding property and an excellent pressure-sensitive adhesive property, and can prevent an adhesive residue on an adherend at the time of its peeling. The backgrinding tape includes a base material and a UV-curable pressure-sensitive adhesive layer, wherein the UV-curable pressure-sensitive adhesive layer that is free from being subjected to UV irradiation has a shear storage modulus of elasticity at 25° C. of 0.175 MPa or more and a pressure-sensitive adhesive strength to silicon of 1 N/20 mm or more, and wherein the UV-curable pressure-sensitive adhesive layer subjected to the UV irradiation of the backgrinding tape has a tensile storage modulus of elasticity at 25° C. of 300 MPa or less and a pressure-sensitive adhesive strength to silicon of 0.15 N/20 mm or less.

Provided is a backgrinding tape, which has an excellent unevenness-embedding property and an excellent pressure-sensitive adhesive property, and can prevent an adhesive residue on an adherend at the time of its peeling. The backgrinding tape includes a base material and a UV-curable pressure-sensitive adhesive layer, wherein the UV-curable pressure-sensitive adhesive layer that is free from being subjected to UV irradiation has a shear storage modulus of elasticity at 25° C. of 0.175 MPa or more and a pressure-sensitive adhesive strength to silicon of 1 N/20 mm or more, and wherein the UV-curable pressure-sensitive adhesive layer subjected to the UV irradiation of the backgrinding tape has a tensile storage modulus of elasticity at 25° C. of 300 MPa or less and a pressure-sensitive adhesive strength to silicon of 0.15 N/20 mm or less.

An interlayer film for laminated glass, comprising a first layer containing a polyvinyl acetal-based resin, wherein the first layer contains no plasticizer or contains a plasticizer in an amount of 15 parts by mass or less based on 100 parts by mass of the resin contained in the first layer, and the first layer has a glass transition temperature (Tg) of 50° C. or lower.